Polymer Brush Interface Layer for EUV Photoresist Adhesion
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Solution Overview
Problem
In extreme ultraviolet (EUV) lithography, there are challenges with the adhesion of photoresists to underlying substrates, leading to pattern collapse and residue issues, which are not effectively addressed by existing technologies, especially for small-dimensioned patterns.
Innovation Solution
The use of polymer brushes grafted to inorganic substrates to mediate interfacial interactions between photoresists and substrates, enhancing adhesion and allowing for improved stability and reduced residue through functional groups that facilitate bonding, interface tuning, and cleavability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If conventional photoresist adhesion methods are used, then adhesion to substrate is achieved, but pattern collapse and residue issues occur
Solution Approach 1:
A polymer brush layer is introduced as an intermediary between the inorganic substrate and the photoresist. This polymer brush mediates interfacial interactions by providing functional groups that enhance adhesion while maintaining pattern stability, preventing both pattern collapse and residue formation.
2Reliability
If polymer brush adhesion layer is introduced, then adhesion and pattern stability are improved, but processing complexity increases
Solution Approach 1:
The polymer brush properties (molecular weight, functional group composition, grafting density) are optimized to achieve effective adhesion promotion with minimal processing steps. The polymer brush is designed to be compatible with existing lithographic processes while providing the necessary interfacial mediation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polymer brushes provide stable adhesion and reduce residue, preventing pattern disruption, and can be formulated without significant processing complexity or expense, enabling high-resolution patterning in semiconductor fabrication.
Implementation Method 1
polymer brushes for mediating interfacial interactions between photoresists and inorganic substrates
Data Source
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AI summary
A polymer brush with a plurality of repgat units wherein some portions of the repeat units have one or more grafting groups and some portions have one or more interface tuning groups is disclosed,. The grafting groups are selected based, eh the identity of an inorganic substrate, and the interface tuning groups are selected based on' the identity of a photoresist that will interact with the groups. A process of lithographic patterning and' an electronic device comprising at least one integrated circuit formed by the process of lithographic patterning are disclosed as well. The process comprises providing an inorganic substrate, depositing the disclosed polymer brush onto the inorganic substrate, and depositing a photoresist onto the: polymer brush. The process further comprises masking the photoresist with a photomask having a pattern, and applying energy to the masked photoresist to form an etch mask. The inorganic substrate is then etched.