Polypeptide Photoresist Composition for High-Resolution Patterning

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Solution Overview

Problem

Current photoresist materials used in semiconductor devices face challenges in achieving high-resolution patterns due to acid diffusion during development, and they often contain hazardous chemicals that are detrimental to human health and the environment.

Innovation Solution

A polypeptide-based photoresist composition is developed, comprising a region A with high alanine content and a region B rich in tyrosine and polar amino acids, which forms a photoresist film that can be patterned using high-energy light without the need for hazardous chemicals.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If chemically amplified materials are used for photoresist, then the photoresist can be developed, but acid diffusion occurs during development which reduces pattern resolution

Engineering Contradiction:

Improvephotoresist developmentVSAvoidpattern resolution

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent extracts and eliminates the acid diffusion mechanism from the photoresist system by using polypeptide-based materials that do not rely on chemically amplified acid-catalyzed reactions, thereby removing the source of pattern degradation while maintaining developability

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent changes the fundamental chemical mechanism of photoresist action from acid-catalyzed chemical amplification to direct photochemical reactions in polypeptide materials, altering the reaction pathway to eliminate acid diffusion while enabling pattern formation

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If conventional photoresist materials are used, then patterning can be achieved, but hazardous chemicals are required which are detrimental to human health and the environment

Engineering Contradiction:

Improvepatterning capabilityVSAvoidhazardous chemicals

Core Design Contradiction:

Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent converts the previously harmful reliance on hazardous chemical amplifiers into a beneficial eco-friendly system by using biodegradable polypeptide materials that eliminate toxic substances while maintaining or improving patterning performance

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The patent employs biodegradable polypeptide materials that can be easily disposed of or degraded after use, replacing persistent hazardous chemicals with environmentally friendly alternatives that break down naturally, reducing long-term environmental impact

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The polypeptide-based photoresist composition enables the formation of high-resolution patterns in semiconductor devices while being eco-friendly, reducing the use of hazardous chemicals and minimizing environmental impact.

Implementation Method 1

exposing at least a portion of the photoresist film to high-energy light

Methodology Applied

Scientific EffectPhotoabsorption: Absorption (EM radiation)

Data Source

PatentUS20250155807A1Polypeptide, photoresist composition including the same, and method of forming pattern using the same

Publication Date: 2025.05.15 SAMSUNG ELECTRONICS CO LTD

AI summary

A polypeptide, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.