Polyrotaxane Urethane Resin Polishing Pad Abrasion Resistance
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional urethane resins used in polishing pads lack sufficient abrasion resistance and scratch resistance, leading to reduced polishing efficiency and stability in semiconductor wafer polishing processes.
Innovation Solution
A novel urethane resin is developed by reacting a polyrotaxane with a urethane prepolymer and a polyfunctional active hydrogen-containing compound, creating a crosslinked structure that enhances mechanical properties and reduces hysteresis loss.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If conventional urethane resin is used in polishing pads, then the polishing pad can be manufactured with standard materials, but the abrasion resistance and scratch resistance are insufficient
Solution Approach 1:
The patent uses a composite molecular structure formed by cyclic molecules clathrating an axial molecule (polyrotaxane structure) to create a novel urethane resin with enhanced abrasion resistance. This composite structure at the molecular level provides superior mechanical properties while maintaining manufacturability through standard polymerization processes.
Solution Approach 2:
The patent changes the fundamental molecular structure parameter by introducing polyrotaxane with side chains having active hydrogen groups, which then react with isocyanate groups to form crosslinked structures. This parameter change in molecular architecture transforms the resin properties to achieve high abrasion resistance.
2Productivity
If conventional urethane resin is used in polishing pads, then the production process remains simple, but the polishing efficiency and stability are reduced
Solution Approach 1:
The novel urethane resin employs a composite molecular structure where cyclic molecules (such as cyclodextrin) clathrate an axial molecule to form polyrotaxane, which then incorporates side chains with active hydrogen. This composite structure at the molecular level provides enhanced polishing efficiency and stability while the overall manufacturing process remains relatively simple.
Solution Approach 2:
The patent introduces side chains with active hydrogen groups at specific locations on the cyclic molecules within the polyrotaxane structure. This local modification creates crosslinking points that enhance the overall resin performance for polishing applications without requiring complete structural redesign.
3Strength
If polyrotaxane is merely mixed with thermoplastic polyurethane, then the mechanical characteristics are improved, but the abrasion resistance remains insufficient
Solution Approach 1:
The patent merges the polyrotaxane structure with the urethane resin system through chemical reaction rather than simple mixing. The side chains with active hydrogen on the polyrotaxane cyclic molecules react with isocyanate groups to form covalent crosslinks, creating a unified molecular network that provides superior abrasion resistance compared to physical mixing.
Solution Approach 2:
The patent changes the interaction parameter between polyrotaxane and urethane resin from physical mixing to chemical crosslinking. By introducing active hydrogen-containing side chains on the polyrotaxane, the system transitions from a simple mixture to a chemically bonded composite with enhanced mechanical and abrasion resistance properties.
4Strength
If diol compound is used as polyol in urethane resin, then the synthesis process is straightforward, but no crosslinked structure is formed resulting in poor abrasion resistance
Solution Approach 1:
The patent changes the functional group parameter of the polyol component by using polyrotaxane with side chains containing active hydrogen (such as hydroxyl groups) instead of conventional diol compounds. This parameter change enables the formation of crosslinked structures through reaction with isocyanate groups, transforming the linear urethane resin into a crosslinked network with superior abrasion resistance.
Solution Approach 2:
The patent creates a composite molecular system where polyrotaxane (composed of cyclic and axial molecules) serves as the polyol component. This composite structure with side chains provides both the flexibility of conventional polyols and the ability to form crosslinked networks, achieving enhanced mechanical properties without excessive structural complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resulting urethane resin exhibits improved abrasion resistance, scratch resistance, and polishing efficiency, enabling stable and high-speed polishing of semiconductor wafers with reduced flaws.
Implementation Method 1
reacting a polyrotaxane with a urethane prepolymer and a polyfunctional active hydrogen-containing compound, creating a crosslinked structure that enhances mechanical properties
Implementation Method 2
a urethane prepolymer (B2) having an iso(thio)cyanate group at an end of a molecule thereof, which is obtained by reacting a bifunctional active hydrogen-containing compound (C1) having two groups having active hydrogen in a molecule thereof and a bifunctional iso(thio)cyanate group-containing compound (B1)
Data Source
AI summary
The present invention relates to a urethane resin obtained by reacting a polymerizable composition containing at least a urethane prepolymer (B2) having an iso(thio)cyanate group at an end of a molecule thereof, which is obtained by reacting a bifunctional active hydrogen-containing compound (C1) having two groups having active hydrogen in a molecule thereof and a bifunctional iso(thio)cyanate group-containing compound (B1) having two iso(thio)cyanate groups in a molecule thereof, a polyrotaxane (A) having a composite molecular structure formed by an axial molecule and a plurality of cyclic molecules clathrating the axial molecule, in which side chains having a group having active hydrogen are introduced into at least a part of the cyclic molecules, and a polyfunctional active hydrogen-containing compound (C2) other than the polyrotaxane (A) and having three or more groups having active hydrogen in a molecule thereof. In accordance with the present invention, it is possible to provide a urethane resin for a sliding member with high abrasion resistance and capable of being suitably used as a polishing pad.
