Photo-curing Polysiloxane Composition for Uniform Protective Films
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Solution Overview
Problem
Existing photo-curing polysiloxane compositions for forming protective films in displays and optical waveguides face issues with heat resistance, transparency, developing property, and film thickness uniformity, leading to suboptimal performance.
Innovation Solution
A photo-curing polysiloxane composition comprising polysiloxane, o-naphthoquinonediazidesulfonate compound, and solvent, with a specific molecular weight distribution and hydroxyl value, is used to form a protective film that enhances developing property and film thickness uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If photosensitive resin composition including alkali-soluble acrylic resin, quinonediazido group compound, crosslinker, or photo-acid generator is used, then the protective film can be formed, but heat resistance is insufficient and discoloration occurs at high temperature
Solution Approach 1:
The patent changes the chemical composition parameters by using polysiloxane resin instead of conventional acrylic resin, and specifically controls the molecular weight distribution (35-60 wt% in 500-2000 range) and hydroxyl value (15-50 mg KOH/g) to achieve both high transparency and heat resistance without discoloration
Solution Approach 2:
The patent creates a composite photo-curing composition by combining polysiloxane resin with specific photo-curing agents (o-naphthoquinonediazidesulfonate compound) and solvents, forming a multi-component system that achieves superior heat resistance and transparency compared to single-resin systems
2Reliability
If resin composition including imide structure resin, siloxane polymer, photo-acid generator, and crosslinker is used, then oxidative decomposition resistance is improved, but developing property and film thickness uniformity are insufficient
Solution Approach 1:
The patent optimizes the molecular weight distribution parameters of polysiloxane resin, specifically controlling the weight percentage in different molecular weight ranges (less than 30 wt% above 8000, 35-60 wt% in 500-2000 range) to achieve both oxidative resistance and uniform film formation
Solution Approach 2:
The patent introduces local quality control by specifying different molecular weight fractions with different functions: lower molecular weight fractions (500-2000) for flow and uniformity, and higher molecular weight fractions for structural integrity and oxidative resistance
3Strength
If polysiloxane with high molecular weight fraction is used, then structural integrity is improved, but developing property and film thickness uniformity deteriorate
Solution Approach 1:
The patent applies local quality by creating a bimodal molecular weight distribution where different molecular weight fractions serve different functions: lower MW fractions (500-2000) provide good flow and uniformity, while higher MW fractions provide structural integrity
Solution Approach 2:
The patent changes the molecular weight distribution parameters to achieve optimal balance: limiting high MW fraction to less than 30 wt% and maintaining 35-60 wt% in the 500-2000 range, which optimizes both structural integrity and film uniformity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves superior transparency, stability, and uniformity in film thickness, addressing the limitations of previous technologies by controlling molecular weight distribution and hydroxyl value, resulting in improved performance for protective films in displays and optical waveguides.
Implementation Method 1
it has gradually come to light by experimentation that o-naphthoquinonediazidesulfonate compounds have high reactivity as photo-curing agents
Implementation Method 2
Photo-curing polysiloxane composition and protective film formed from the same
Data Source
AI summary
A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains less than 30 wt % of a polysiloxane fraction having a molecular weight above 8,000, and 35 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 500 to 2,000 when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 500 and 50,000 measured by gel permeation chromatography. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.