Polyurethane Polishing Pad Composition for CMP Trade-Off

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Solution Overview

Problem

Chemical mechanical polishing (CMP) pads face a trade-off between pad life and removal rate, with soft pads having prolonged life but poor removal rates and hard pads having high removal rates but short lives, necessitating a balance for improved performance.

Innovation Solution

A polyurethane polishing pad composition comprising 15-25 wt% 4,4′-methylene-bis(2-chloroaniline), 25-45 wt% isocyanates, 15-45 wt% polyols, 5-35 wt% ethylene oxide propylene oxide copolyol (EOPO), and 1-5 wt% additives, resulting in a hardness of 40-70 shore D, elongation of 200-400%, density of 0.7-0.9 g/cc, modulus of 25000-40000 kg/cm2, and tensile stress of 120-320 kg/cm2, which balances wear rate and removal efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Duration of action of stationary object

If a soft polishing pad is used, then pad life is prolonged, but removal rate deteriorates

Engineering Contradiction:
Improvepad lifeVSAvoidremoval rate
Core Design Contradiction:
Duration of action of stationary objectVSProductivity

Solution Approach 1:

The patent applies parameter changes by precisely controlling the composition ratios of isocyanates (25-45 wt%), polyols (15-45 wt%), and EOPO (5-35 wt%), along with curing conditions, to achieve a specific hardness range (40-70 shore D) that simultaneously provides prolonged pad life and high removal rate

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses composite materials by combining multiple polyol types (polyether polyol, polyester polyol), isocyanates, and EOPO in specific proportions to create a polyurethane foam with optimized mechanical properties that balance durability and polishing performance

Inventive Principle:
Principle #40Composite materials

2Productivity

If a hard polishing pad is used, then removal rate is improved, but pad life deteriorates

Engineering Contradiction:
Improveremoval rateVSAvoidpad life
Core Design Contradiction:
ProductivityVSDuration of action of stationary object

Solution Approach 1:

The patent applies parameter changes by precisely controlling the composition ratios of isocyanates (25-45 wt%), polyols (15-45 wt%), and EOPO (5-35 wt%), along with curing conditions, to achieve a specific hardness range (40-70 shore D) that simultaneously provides prolonged pad life and high removal rate

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses composite materials by combining multiple polyol types (polyether polyol, polyester polyol), isocyanates, and EOPO in specific proportions to create a polyurethane foam with optimized mechanical properties that balance durability and polishing performance

Inventive Principle:
Principle #40Composite materials

3Stability of the object's composition

If elongation is increased, then pad flexibility is improved, but structural stability deteriorates

Engineering Contradiction:
Improvepad flexibilityVSAvoidstructural stability
Core Design Contradiction:
Stability of the object's compositionVSStrength

Solution Approach 1:

The patent applies parameter changes by optimizing the NCO index (100-200) and composition ratios to achieve elongation within 200-400% while maintaining structural stability through controlled cross-linking density and foam cell structure

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses composite materials by combining polyether polyol (providing flexibility and elongation), polyester polyol (providing structural strength), and EOPO (modulating mechanical properties) to achieve both high elongation and structural stability

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The polyurethane polishing pad achieves a high removal rate while extending pad life through its unique mechanical properties, optimizing CMP performance.

Implementation Method 1

a composition for manufacturing a polyurethane polishing pad is provided. The composition includes 15 to 25 wt % of MBCA, 25 to 45 wt % of isocyanates, 15 to 45 wt % of polyols, 5 to 35 wt % of ethylene oxide propylene oxide copolyol (EOPO)

Methodology Applied
Scientific EffectPolyaddition reaction: Chemical Bonding

Implementation Method 2

the composition is heated to cure and produce a polyurethane resin foam

Methodology Applied
Scientific EffectThermal curing: Heating

Data Source

PatentUS11717932B2Polyurethane polishing pad and composition for manufacturing the same
Publication Date: 2023.08.08 XIA TAI XIN SEMICON QING DAO LTD
  • US11717932B2 patent drawing
  • US11717932B2 patent drawing
  • US11717932B2 patent drawing

AI summary

The present disclosure provides a composition for manufacturing a polyurethane polishing pad. The composition includes 15 to 25 wt % of MBCA, 25 to 45 wt % of isocyanates, 15 to 45 wt % of polyols, 5 to 35 wt % of EOPO, and 1 to 5 wt % of additives. The polyurethane polishing pad made from the composition of the present disclosure has a hardness within a range of 40 to 70 shore D, an elongation within a range of 200 to 400%, a density within a range of 0.7 to 0.9 g/cc, a modulus within a range of 25000 to 40000 kg/cm2, and a tensile stress within a range of 120 to 320 kg/cm2.