Polyurethane Polishing Pads with Reactive Tertiary Amine

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Solution Overview

Problem

Polyurethane films used in polishing applications, such as Chemical Mechanical Planarization (CMP), face challenges in maintaining uniform thickness and feature dimensions due to viscosity changes during melt processing, which affects polishing performance and durability.

Innovation Solution

Incorporating reactive tertiary amine compounds in the synthesis of polyurethanes to improve viscosity stability, allowing for the production of polyurethane films with consistent thickness and feature dimensions, thereby enhancing the fabrication of polishing layers with precise topography.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If polyurethane films are used in polishing applications, then polishing performance is achieved, but viscosity changes during melt processing cause non-uniform thickness and feature dimensions

Engineering Contradiction:
Improveuniformity of thickness and feature dimensionsVSAvoidviscosity stability during processing
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent modifies the chemical composition parameters of the polyurethane by incorporating reactive tertiary amine compounds (0.1-10 wt%) into the polymer structure. This chemical parameter change stabilizes the viscosity during melt processing, enabling uniform film thickness and precise feature dimensions while maintaining polishing performance.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite polyurethane material by combining traditional polyurethane components with reactive tertiary amine compounds. This composite structure provides both the desired polishing properties and improved viscosity stability during processing, resolving the contradiction between manufacturing precision and composition stability.

Inventive Principle:
Principle #40Composite materials

2Manufacturing precision

If reactive tertiary amine compounds are incorporated to stabilize viscosity, then manufacturing precision improves, but synthesis complexity increases

Engineering Contradiction:
Improveconsistency of thickness and feature dimensionsVSAvoidsynthesis process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The reactive tertiary amine compounds are incorporated into the polyurethane synthesis process itself, performing the viscosity stabilization function during the initial material creation. This preliminary action eliminates the need for separate viscosity modification steps, reducing overall process complexity while achieving consistent manufacturing results.

Inventive Principle:
Principle #10Preliminary action

3Reliability

If uniform thickness is achieved through viscosity stabilization, then polishing performance improves, but processing time may increase

Engineering Contradiction:
Improvepolishing performance consistencyVSAvoidfilm processing time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The incorporation of reactive tertiary amine compounds modifies the rheological parameters of the polyurethane melt, stabilizing viscosity across the processing temperature range. This parameter change allows for faster processing cycles without sacrificing uniformity, as the material maintains consistent flow characteristics throughout the extrusion and molding process.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20230383048A1Polyurethanes, Polishing Articles and Polishing Systems Therefrom and Method of Use Thereof
Publication Date: 2023.11.30 3M INNOVATIVE PROPERTIES CO
  • US20230383048A1 patent drawing
  • US20230383048A1 patent drawing
  • US20230383048A1 patent drawing

AI summary

The present disclosure relates to polyurethane comprising a reaction product of a reactive mixture including a polyester polyol, a diol chain extender, a diisocyanate; and a reactive, tertiary amine. The present disclosure further provides polishing layers and polishing pads fabricated therefrom. Additionally, the present disclosure provides polishing systems and polishing methods employing said polishing layers and polishing pads.