Positive Resist Composition for Lithography Heat Resistance
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Solution Overview
Problem
Conventional resist compositions face challenges in achieving both excellent lithography properties and heat resistance, particularly in forming fine patterns with narrow pitches, where mask error factors and pattern collapse occur, and heat resistance is limited, restricting the latitude of bake temperatures.
Innovation Solution
A positive resist composition is developed that includes a polymeric compound with specific structural units, such as those derived from acrylate esters containing acid-dissociable dissolution inhibiting groups and hydroxy group-containing aliphatic hydrocarbon groups, which improves heat resistance and lithography properties by adjusting the molecular structure to enhance solubility in alkali developing solutions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used to form fine patterns with narrow pitches, then lithography properties such as resolution and sensitivity are improved, but mask error factors and pattern collapse occur, and heat resistance is limited
Solution Approach 1:
The patent uses a composite base resin system comprising multiple structural units: (a) cyclic carbonate structure units that provide heat resistance and adhesion, (b) acrylate ester units with acid-dissociable dissolution-inhibiting groups that enable chemically amplified solubility control, and (c) hydroxy group-containing aliphatic hydrocarbon units that enhance compatibility with developing solutions. This composite molecular architecture allows simultaneous achievement of excellent lithography properties and heat resistance, resolving the contradiction between precision pattern formation and thermal stability during processing
2Manufacturing precision
If the resist composition is optimized for high resolution and sensitivity, then lithography properties are improved, but the latitude of bake temperatures is restricted
Solution Approach 1:
The patent modifies the molecular parameters of the base resin by incorporating specific structural units with controlled proportions. The cyclic carbonate units (formula a0) provide thermal stability that expands bake temperature latitude, while the acrylate ester units (formula a1) provide acid-dissociable dissolution-inhibiting groups that maintain high resolution. The hydroxy group-containing aliphatic hydrocarbon units (formula a3) enhance compatibility with alkali developing solutions. This parameter optimization allows the resist to maintain excellent lithography properties across a broader range of bake temperatures
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved heat resistance and lithography properties, allowing for more precise pattern formation with reduced pattern collapse and expanded bake temperature latitude, while maintaining high resolution and sensitivity.
Implementation Method 1
an acid generator that generates acid upon exposure. If the resist film formed using the resist composition is selectively exposed during formation of a resist pattern, then within the exposed portions, acid is generated from the acid generator
Implementation Method 2
a chemically amplified composition is used, which includes a base material component that exhibits a changed solubility in an alkali developing solution under the action of acid
Data Source
AI summary
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.