Precursor Level Monitoring via Pressure Pulse Analysis
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Solution Overview
Problem
Current methods for monitoring the amount of solid precursor in semiconductor manufacturing processes are inadequate due to challenges in resolution and accuracy, especially under high temperature conditions and with the use of carrier gases, which can lead to manufacturing defects and inefficient precursor management.
Innovation Solution
A method and system that utilize pressure pulses sensed by a pressure gauge and analyzed by a processor to quantify the remaining amount of solid precursor in a vessel, generating signals for sufficient or insufficient precursor levels to control deposition processes, potentially combined with capacitive sensors for enhanced accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If carrier gas is used to transport solid precursor from precursor vessel to reaction chamber, then precursor delivery is enabled, but monitoring of precursor level becomes challenging with existing level sensing systems
Solution Approach 1:
The patent replaces traditional mechanical level sensing systems with a pressure-based monitoring system. By measuring pressure changes in the precursor vessel during carrier gas flow, the system infers precursor level without direct mechanical contact or complex sensing mechanisms, thereby enabling both effective precursor delivery and accurate monitoring.
Solution Approach 2:
The patent introduces pressure as an intermediary parameter to indirectly measure precursor level. Instead of directly sensing the solid precursor level (which is difficult), the system uses pressure changes caused by carrier gas flow through the precursor vessel to infer the amount of precursor remaining, solving the measurement challenge while maintaining delivery functionality.
2Productivity
If high temperature conditions are employed for precursor vaporization, then precursor vaporization is enhanced, but monitoring accuracy and resolution deteriorate
Solution Approach 1:
The patent substitutes temperature-based monitoring approaches with pressure-based monitoring. By using pressure sensors to detect pressure changes during carrier gas flow, the system can accurately monitor precursor levels even under high temperature conditions where traditional temperature-based sensing becomes unreliable or less precise.
Solution Approach 2:
The patent changes the monitoring parameter from temperature to pressure. By measuring pressure changes rather than temperature, the system maintains high resolution and accuracy in precursor level monitoring while allowing the process to operate at high temperatures for effective precursor vaporization. The pressure parameter remains suitable for measurement even in high-temperature environments.
3Ease of manufacture
If solid precursor is used instead of gaseous or liquid precursor, then precursor storage and handling is simplified, but level monitoring becomes more complex
Solution Approach 1:
The patent replaces complex mechanical level sensing systems with a simpler pressure-based monitoring approach. By using pressure sensors to detect pressure changes during carrier gas flow, the system achieves accurate solid precursor level monitoring without requiring complex mechanical sensors or direct contact with the solid material, thus simplifying the overall system while maintaining monitoring capability.
Solution Approach 2:
The patent introduces pressure as an intermediary measurement that indirectly indicates solid precursor level. This approach avoids the need for direct mechanical sensing of the solid material, using instead the pressure changes in the carrier gas flow to infer the amount of solid precursor remaining, thereby simplifying the monitoring system architecture.
4Reliability
If existing level sensing systems are used for solid precursor, then monitoring capability is maintained, but resolution and accuracy are insufficient
Solution Approach 1:
The patent replaces existing level sensing systems with a pressure-based monitoring system that provides superior resolution and accuracy. By measuring pressure changes during carrier gas flow and analyzing the pressure-time profile, the system achieves more precise and reliable precursor level measurement, enabling better control of the deposition process and improved inventory management.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for precise monitoring of solid precursor levels, preventing depletion-related misprocessing, optimizing precursor use, and improving inventory management and process control in semiconductor manufacturing.
Implementation Method 1
precursor material is transported from the precursor vessel to the reactor chamber by flowing a carrier gas through the precursor vessel, thereby generating a process gas comprising the carrier gas and vaporized solid precursor
Data Source
AI summary
Methods and related systems, precursor vessels, data processing systems, computer program products, and computer-readable media that can be employed for determining an amount of precursor in a precursor vessel. Embodiments of presently described methods can comprise carrying out an analyzing sequence, by a processor, of at least the pressure as a function of time, thereby quantifying a remaining amount of the precursor.