Pressure Sensor Uniformity Certification for Wafer Handling

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Solution Overview

Problem

Manual adjustment of contact areas in semiconductor wafer handling machinery leads to non-uniform pressure, causing microcracks in wafers during back-grinding operations due to insufficient parallel adjustment and pressure control.

Innovation Solution

Implementation of pressure-sensitive large-area sensors with single-zone force sensing resistors to objectively monitor and ensure uniform mechanical pressure distribution, replacing manual adjustments for reproducible and accurate pressure control.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If manual adjustment of contact areas is used, then ease of operation is improved, but manufacturing precision deteriorates due to non-uniform pressure causing microcracks

Engineering Contradiction:
Improveease of operationVSAvoidmanufacturing precision
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The patent replaces manual mechanical adjustment with an automated sensor-based system. Pressure-sensitive sensors (such as force sensing resistors) are integrated into the contact areas to automatically detect and signal pressure non-uniformity, eliminating the need for manual adjustment while ensuring uniform pressure distribution and preventing microcracks

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent implements a feedback mechanism where pressure sensors continuously monitor the pressure distribution in contact areas and provide real-time signals to the control system. This feedback loop enables automatic adjustment to maintain uniform pressure, resolving the contradiction between ease of operation and manufacturing precision

Inventive Principle:
Principle #23Feedback

2Device complexity

If manual adjustment for parallelity is performed, then device complexity is reduced, but measurement precision deteriorates due to arbitrary adjustment

Engineering Contradiction:
Improvedevice complexityVSAvoidmeasurement precision
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent substitutes manual visual inspection and arbitrary adjustment with objective sensor-based measurement. Pressure-sensitive sensors provide quantitative data on pressure distribution, enabling precise measurement and control of parallelity without increasing device complexity

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The system performs self-adjustment based on sensor feedback, automatically correcting parallelity issues without requiring external measurement tools or complex adjustment mechanisms, thereby maintaining simplicity while improving precision

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of pressure sensors prevents microcrack induction by ensuring consistent and uniform pressure distribution during wafer handling, enhancing the reliability and precision of semiconductor wafer processing.

Implementation Method 1

The resistance decreases when pressure is applied to the surface of the sensor plates, and consequently the voltage output increases

Methodology Applied
Scientific EffectPiezoresistive effect: Piezoresistive Effect

Data Source

PatentUS10388548B2Apparatus and method for operating machinery under uniformly distributed mechanical pressure
Publication Date: 2019.08.20 TEXAS INSTRUMENTS INC
  • US10388548B2 patent drawing
  • US10388548B2 patent drawing
  • US10388548B2 patent drawing

AI summary

A method of certifying uniform distribution of mechanical pressure comprises an apparatus for moving an object, the apparatus including an arm (410) with a joint (430) for adjusting a fixture (420) having a flat surface area (420a). The fixture includes vacuum suction for holding the object. The method further uses a pressure sensor (450) with a flat surface area (450a), displaying output voltage as a function of mechanical pressure applied. When the sensor is placed on a chuck with vacuum suction, the apparatus moves (460) to bring the flat fixture surface in touch with the flat sensor. Mechanical pressure is applied from the fixture to the sensor; the voltage output of the sensor is monitored to certify uniform distribution of the fixture pressure across the sensor area.