Print Recognition Substrate Layout for Direct Light Shielding
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing print recognition technologies face interference from direct light emission from the backlight to the photoelectric conversion structure, affecting the accuracy and sensitivity of fingerprint recognition.
Innovation Solution
A print recognition substrate is designed with a light shielding structure that includes metal layers positioned under the photoelectric conversion structure to prevent direct light emission, utilizing electrodes in the same layers as the data and gate lines to maximize the blocked area and improve recognition accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If the photoelectric conversion structure is positioned close to the backlight, then light emission efficiency is improved, but direct light interference affects recognition accuracy
Solution Approach 1:
The patent divides the electrode structure into multiple segments: a first electrode (anode) and a second electrode (cathode) that are spatially separated and positioned at different locations relative to the photoelectric conversion structure. This segmentation allows the electrodes to be arranged in a configuration that blocks direct light paths while maintaining electrical functionality for photoelectric conversion, thus resolving the contradiction between light emission efficiency and recognition accuracy.
2Measurement precision
If the light shielding structure is added to block direct light, then recognition accuracy is improved, but device complexity increases
Solution Approach 1:
The patent makes the electrode structure serve dual functions: it provides electrical connectivity for the photoelectric conversion structure while simultaneously acting as a light shielding structure. The first and second electrodes are positioned to block direct light paths from the backlight to the photoelectric conversion structure, thereby eliminating the need for separate light shielding components and reducing overall device complexity while improving recognition accuracy.
3Power
If the photoelectric conversion structure area is maximized, then conversion efficiency is improved, but parasitic capacitance increases
Solution Approach 1:
The patent transitions from a conventional planar electrode arrangement to a three-dimensional spatial configuration where the first and second electrodes are positioned at different locations and orientations relative to the photoelectric conversion structure. This dimensional change allows the electrodes to be arranged in a configuration that minimizes overlapping area and parasitic capacitance while still enabling effective photoelectric conversion, thus resolving the contradiction between conversion efficiency and parasitic capacitance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively blocks direct light emission, enhancing the sensitivity and accuracy of print recognition by maximizing the area of the photoelectric conversion structure, thereby improving the effectiveness of fingerprint recognition.
Implementation Method 1
a light shielding structure, located on the base substrate, and including at least one metal layer
Implementation Method 2
a photoelectric conversion structure, located on a side of the light shielding structure away from the base substrate
Data Source
AI summary
A print recognition substrate and a print recognition apparatus. The print recognition substrate includes a base substrate, which includes a data line and a gate line crossing each other; a light shielding structure, located on the base substrate, and including a metal layer, and an orthographic projection of the light shielding structure on the base substrate does not overlap with orthographic projections of the data line and the gate line on the base substrate; a photoelectric conversion structure, located on the side of the light shielding structure away from the base substrate, and an orthographic projection of the photoelectric conversion structure on the base substrate is located in an orthographic projection of the light shielding structure on the base substrate, and a distance between an edge of the photoelectric conversion structure and an edge of the light shielding structure is less than or equal to 3 μm.