Thermal Inkjet Printhead Etch Stop Layer CMOS MEMS Integration

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Solution Overview

Problem

The high investment required for setting up silicon foundries to manufacture advanced thermal inkjet printheads limits small-scale production, leading to the use of outdated technologies in industrial printing, where high integration levels and special materials are needed but not economically justified.

Innovation Solution

A method for forming a thermal inkjet printhead using a semiconductor wafer with a pre-fabricated integrated circuit and thermal actuator section, where a thermal insulating layer and metal layers are used as an etch stop, allowing for cost-effective production by integrating CMOS and MEMS technologies without requiring heavy investment in full custom processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If complete manufacturing processes for high integration printhead actuators are carried out using specialized silicon foundries, then manufacturing precision and device performance are improved, but investment cost increases significantly

Engineering Contradiction:
Improveprinthead actuator integrationVSAvoidinvestment cost
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The manufacturing process is divided into two independent segments: standard CMOS logic circuit fabrication performed by conventional foundries, and thermal actuator element fabrication performed by specialized foundries. This segmentation allows each segment to be optimized independently while reducing overall investment requirements.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The semiconductor wafer is prepared in advance with all CMOS circuit layers (logic, power, thermal insulation) completed before transfer to the specialized foundry. This preliminary action enables the specialized foundry to focus only on the actuator fabrication, reducing their equipment requirements and investment cost.

Inventive Principle:
Principle #10Preliminary action

2Ease of manufacture

If standard CMOS technology is used for electronic circuitry, then ease of manufacture and investment cost are improved, but manufacturing precision for thermal actuators deteriorates

Engineering Contradiction:
Improveinvestment costVSAvoidthermal actuator fabrication
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

A transfer interface is introduced between the standard CMOS foundry and the specialized MEMS foundry. The pre-fabricated wafer with completed CMOS layers serves as the intermediary that carries all necessary circuit structures to the second foundry, which then adds the actuator elements with high precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

Different regions of the wafer receive different levels of processing quality: the CMOS circuit region is fabricated with standard precision by conventional foundries, while the actuator region receives enhanced precision processing at the specialized foundry. This local differentiation optimizes both cost and performance.

Inventive Principle:
Principle #3Local quality

3Stability of the object's composition

If thermal insulation layers are made thicker to improve thermal stability, then thermal stability is improved, but energy transfer efficiency to ink deteriorates

Engineering Contradiction:
Improvethermal stabilityVSAvoidenergy transfer to ink
Core Design Contradiction:
Stability of the object's compositionVSUse of energy by moving object

Solution Approach 1:

The thermal insulation layer parameters are precisely controlled within an optimal range (500-2000 nm thickness) rather than simply increasing thickness. This parameter optimization ensures sufficient thermal stability for the CMOS circuits while maintaining adequate energy transfer efficiency to the ink for droplet ejection.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the production of high-performance thermal inkjet printheads with low investment costs, leveraging standard CMOS technology for electronic circuitry and specialized MEMS components, facilitating efficient energy transfer and ink ejection while maintaining thermal stability and mechanical robustness.

Implementation Method 1

etching a heater section for forming a thermal actuator element down to the first metal layer such that the first metal layer is acting as an etch stop layer

Methodology Applied
Scientific EffectEtch stop layer:

Implementation Method 2

the integrated circuit comprising at least a thermal insulating layer formed over a substrate

Methodology Applied
Scientific EffectThermal insulation: Thermal Insulation

Implementation Method 3

The heaters 2 may be made of a resistive film

Methodology Applied
Scientific EffectJoule heating: Joule Heating

Data Source

PatentUS11225080B2Method for forming thermal inkjet printhead, thermal inkjet printhead, and semiconductor wafer
Publication Date: 2022.01.18 SICPA HOLDING SA
  • US11225080B2 patent drawing
  • US11225080B2 patent drawing
  • US11225080B2 patent drawing

AI summary

The present invention provides a method for forming a thermal inkjet printhead, comprising at least the following steps: providing a semiconductor wafer including an integrated electronic circuit and a section for forming a thermal actuator element, the integrated circuit comprising at least: a thermal insulating layer formed over a substrate; and a first metal layer formed over the thermal insulating layer; wherein the first metal layer extends into the section for forming the thermal actuator element; and etching a section for forming a thermal actuator element to the first metal layer such that the first metal layer is acting as an etch stop layer. Further there is provided a thermal inkjet printhead formed by a method of the present invention and a semiconductor wafer for forming the thermal inkjet printheads by a method of the present invention.