Probe Assembly High Bandwidth Beam Electron Emission Control

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Solution Overview

Problem

Current semiconductor device testing methods, such as atomic force probes and electron beam probe assemblies, face challenges in accurately generating high frequency waveforms due to intrusive methods, insufficient resolution for advanced process nodes, and mechanical vibrations from electron beam alignment, which affect accuracy and bandwidth.

Innovation Solution

An electron beam probe assembly that pulses the primary electron beam without blanking, using a laser to control electron emission, allowing for sub-10 ps pulsing and increased bandwidth, and aligns the beam without mechanical movement by controlling the deflector coils, thereby enhancing resolution and accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If blanking is used to pulse the electron beam, then the electron beam can be controlled to strike the aperture, but mechanical vibrations and alignment issues reduce measurement precision and bandwidth

Engineering Contradiction:
Improvewaveform measurement precisionVSAvoidbeam control complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent extracts and removes the blanking mechanism from the electron beam probe assembly. Instead of using blanking to control the electron beam, the invention uses direct electron emission control through field emission tip modulation, eliminating the source of mechanical vibrations and alignment issues while maintaining beam control capability

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the mechanical blanking system with an electrical field control mechanism. By using voltage modulation on the field emission tip, the electron beam is controlled through electrical means rather than mechanical deflection and blocking, thereby eliminating mechanical vibrations that degraded measurement precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If optical probing is used to generate high frequency waveforms, then non-intrusive testing is achieved, but resolution is insufficient for 5 nm and beyond process nodes

Engineering Contradiction:
Improvespatial resolutionVSAvoidsilicon absorption and charge carrier generation
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent changes the fundamental parameter of the probing mechanism from optical wavelengths to electron beam wavelengths. Electron beams have much shorter effective wavelengths than optical methods, enabling resolution at 5 nm and below process nodes while avoiding the harmful effects of silicon absorption and charge carrier generation that plague UV and visible light probing

Inventive Principle:
Principle #35Parameter changes

3Ease of operation

If contact probes are used to test semiconductor devices, then direct electrical contact is achieved, but intrusive methods prevent probing during active testing

Engineering Contradiction:
Improveprobing accessibilityVSAvoiddevice operation during testing
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The patent introduces an electron beam as an intermediary between the probe assembly and the semiconductor device. The electron beam can penetrate through packaging materials and bond wires to reach internal device structures without making physical contact, enabling non-intrusive probing of active devices during operational testing

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach achieves higher resolution and bandwidth, allowing for precise testing of semiconductor devices with improved sampling rates and reduced mechanical vibrations, enabling accurate waveform generation and imaging at nanometer scales.

Implementation Method 1

an electron source for emitting primary electrons when a voltage exceeds a threshold

Methodology Applied
Scientific EffectField emission: Electron Beam

Implementation Method 2

a photon source positioned to emit photons that strike the electron source such that when the photons strike the electron source, the electron source emits the primary electrons

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Implementation Method 3

detection circuitry configured to detect secondary electrons emitted from a test device of a test assembly and to form an excitation waveform

Methodology Applied
Scientific EffectElectron detection: Electron Beam

Data Source

PatentUS10163601B1Probe assembly with high bandwidth beam
Publication Date: 2018.12.25 INTEL CORP
  • US10163601B1 patent drawing
  • US10163601B1 patent drawing
  • US10163601B1 patent drawing

AI summary

A probe assembly for analyzing a test device that includes a housing with an electron source disposed therein for emitting primary electrons. A photon source is positioned to emit photons that strike the electron source such that when the photons strike the electron source, the electron source emits the primary electrons. Detection circuitry is provided that is configured to detect secondary electrons emitted from a test device of a test assembly and to form an excitation waveform.