Process-Aware IC Cell Layout Generation for Yield Optimization
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Solution Overview
Problem
Existing cell libraries are manually constructed, making automated cell layout generation difficult, and yield optimization during IC design is challenging, leading to unpredictable yield changes with cell modifications.
Innovation Solution
A cell layout generation device that automatically generates cell layouts considering semiconductor manufacturing process and device characteristics, using an optimization engine to optimize yield and construct a high-yield cell library.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Extent of automation
If cell layout is manually generated to construct cell libraries, then design flexibility and control are improved, but automation level and productivity deteriorate
Solution Approach 1:
The patent introduces an optimization engine as an intermediary component that bridges the cell layout generator and the cell library. This optimization engine automatically adjusts layout parameters based on yield optimization models, enabling automated generation without requiring complex manual intervention for each layout adjustment.
Solution Approach 2:
The cell layout generation system performs self-optimization through the optimization engine, which automatically modifies layouts based on yield criteria without external intervention. The system serves itself by iteratively improving layouts through automated yield optimization, reducing the need for complex external control mechanisms.
2Reliability
If yield optimization is performed during IC design, then manufacturing yield is improved, but design time and computational resources increase
Solution Approach 1:
The optimization engine performs yield optimization during the cell layout generation phase, which is an early stage in the IC design process. By addressing yield concerns preliminarily at this stage rather than later during manufacturing or testing, the system improves final yield while minimizing additional design time.
Solution Approach 2:
The optimization engine continuously refines cell layouts through iterative yield optimization during the generation process. This continuous optimization integrates seamlessly into the design workflow, improving yield without requiring separate, time-consuming post-processing steps.
3Reliability
If cell layout parameters are modified to improve yield, then manufacturing yield is improved, but design stability and predictability worsen
Solution Approach 1:
The optimization engine implements a feedback mechanism where yield optimization models evaluate layout configurations and provide guidance for adjustments. This feedback loop ensures that parameter modifications are systematic and predictable, improving yield while maintaining design stability through controlled, data-driven changes.
Solution Approach 2:
The system systematically changes layout parameters based on yield optimization models rather than arbitrary modifications. By controlling and managing parameter changes through defined optimization criteria, the system improves yield while maintaining predictability and stability in the design process.
4Ease of manufacture
If process and device characteristics are considered in layout generation, then manufacturing compatibility is improved, but design complexity increases
Solution Approach 1:
The cell layout generator incorporates process and device characteristics preliminarily during the layout generation phase. By integrating these manufacturing considerations from the outset rather than as separate post-processing steps, the system achieves better process compatibility without significantly increasing overall design complexity.
Data Source
AI summary
The present disclosure relates to a cell layout generation device for integrated circuit design, a system including the same, and a method using the same, and more particularly, to a cell layout generation device for integrated circuit design, a system including the same, and a method using the same, wherein the cell layout generation device includes a cell layout generator configured to determine a placement corresponding to at least one transistor according to a predefined criterion based on data input to generate at least one cell layout, and generate the at least one cell layout by determining a routing corresponding to the placement, wherein the predefined criterion is a process and device-friendly design condition in which semiconductor manufacturing process characteristics and device characteristics are taken into account.