In-situ Process Tube Abnormality Detection via Doppler and Refraction

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Solution Overview

Problem

In semiconductor manufacturing, detecting abnormalities such as bubbles, particles, or debris in the fluid transferred through tubular devices is challenging, leading to impurity defects in substrates and inefficiencies in the manufacturing process due to the need for separate defect inspection tools.

Innovation Solution

The implementation of a process tube device equipped with sensor arrays and a light emitting source allows for the in-situ detection of bubbles and other impurities by measuring changes in fluid velocity and light refraction patterns, eliminating the need for separate inspection tools.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If separate defect inspection tools are used to detect abnormalities in substrates, then detection capability is provided, but processing time increases significantly and manufacturing efficiency decreases

Engineering Contradiction:
Improveabnormality detection capabilityVSAvoidinspection time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent implements preliminary detection of fluid abnormalities (bubbles, particles, debris) within the process tube before the fluid contacts the substrate. By using sensors positioned in the fluid path to detect impurities advance, the system prevents defective fluid from reaching the substrate, eliminating the need for time-consuming post-processing inspection and reducing overall manufacturing time.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If separate defect inspection tools are used to inspect substrates, then abnormalities can be detected, but the entire surface inspection process is time-consuming and occurs after processing is completed

Engineering Contradiction:
Improvedefect detection reliabilityVSAvoidmanufacturing efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent implements a real-time feedback system where sensors continuously monitor the fluid for abnormalities and provide immediate signals to the control system. When impurities are detected, the system automatically adjusts fluid flow or alerts operators, enabling continuous process optimization without stopping production, thereby maintaining both high reliability and productivity.

Inventive Principle:
Principle #23Feedback

3Loss of time

If in-situ detection of fluid abnormalities is implemented, then real-time detection is achieved, but device complexity increases due to additional sensors and light emitting sources

Engineering Contradiction:
Improvedetection timeVSAvoidsensor array complexity
Core Design Contradiction:
Loss of timeVSDevice complexity

Solution Approach 1:

The patent employs a multi-functional sensor array system where the same sensor configuration detects multiple types of abnormalities (bubbles, particles, debris) simultaneously using light refraction and fluid velocity measurements. This universal detection approach eliminates the need for separate specialized sensors for each abnormality type, reducing overall device complexity while maintaining comprehensive real-time monitoring capability.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables real-time, quantitative detection of fluid abnormalities, preventing impurity defects and improving manufacturing efficiency by allowing for immediate action to remove defective fluid from the process.

Implementation Method 1

measuring changes in fluid velocity and light refraction patterns

Methodology Applied
Scientific EffectLight refraction: Refraction

Implementation Method 2

measuring changes in fluid velocity

Methodology Applied
Scientific EffectFluid velocity measurement:

Data Source

PatentUS12326397B2In-situ apparatus for detecting abnormality in process tube
Publication Date: 2025.06.10 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12326397B2 patent drawing
  • US12326397B2 patent drawing
  • US12326397B2 patent drawing

AI summary

A process tube device can detect the presence of any external materials that may reside within a fluid flowing in the tube. The process tube device detects the external materials in-situ which obviates the need for a separate inspection device to inspect the surface of a wafer after applying fluid on the surface of the wafer. The process tube device utilizes at least two methods of detecting the presence of external materials. The first is the direct measurement method in which a light detecting sensor is used. The second is the indirect measurement method in which a sensor utilizing the principles of Doppler shift is used. Here, contrary to the first method that at least partially used reflected or refracted light, the second method uses a Doppler shift sensor to detect the presence of the external material by measuring the velocity of the fluid flowing in the tube.