Layer Structure Fabrication Using Protective Ablation

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The high cost and complexity of photolithography processes in patterning layer structures for OLEDs, particularly for small product series, lead to expensive components and potential quality issues due to debris from ablation processes.

Innovation Solution

A fabrication method and computer program that pattern layers without photolithography by using a protective material to shield the substrate during laser ablation, followed by removal of the protective material and etching to create patterned layers, reducing debris impact and improving layer quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithography is used to pattern the first layer, then manufacturing precision is improved, but device complexity and cost increase

Engineering Contradiction:
Improvepattern precisionVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and removes the expensive photolithography step from the fabrication process. Instead of using photolithography to pattern the first layer, the invention directly deposits patterned material to form the first layer, eliminating the need for photoresist coating, exposure, and development steps while maintaining pattern precision.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the expensive and complex photolithography process with a simpler, more cost-effective direct patterning approach. The direct deposition method uses disposable patterned masks or direct writing techniques that are cheaper than photolithography equipment and materials, while still achieving the required pattern precision.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

2Productivity

If ablation is performed without protective material, then productivity is improved, but object-affected harmful factors increase due to debris

Engineering Contradiction:
Improvefabrication speedVSAvoiddebris contamination
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent applies protective material to the substrate before performing ablation or deposition processes. This preliminary protection step prevents debris from contaminating the substrate and sensitive layers during high-speed ablation, allowing productivity to be maintained without quality degradation.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The protective material acts as an intermediary layer between the ablation process and the substrate. It absorbs and contains debris generated during high-speed ablation, preventing direct contamination of the substrate while allowing the ablation process to proceed at high speed without interruption for cleaning.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces costs and enhances layer structure quality by eliminating the need for photolithography and minimizing debris-related issues, such as unwanted shortcuts, thereby improving the overall fabrication process efficiency.

Implementation Method 1

an ablation unit for ablating the unpatterned first layer through the protective material such that the patterned first layer is generated

Methodology Applied
Scientific EffectLaser ablation: Laser Ablation

Data Source

PatentEP2715830B1Method for fabricating a layer structure
Publication Date: 2019.08.28 OLEDWORKS GMBH
  • EP2715830B1 patent drawingFigure 1
  • EP2715830B1 patent drawingFigure 2~5
  • EP2715830B1 patent drawingFigure 6~9

AI summary

The invention relates to a fabrication apparatus for fabricating a layer structure comprising at least a patterned first layer on a substrate. A layer structure (6) with an unpatterned first layer is provided on the substrate. A protective material application unit (8) applies protective material at least on parts of the provided layer structure for protecting at least the parts of the provided layer structure (6), an ablation unit (12) ablates the unpatterned first layer through the protective material such that the patterned first layer is generated, and the protective material removing unit (15) removes the protective material (9). This allows fabricating a layer structure for, for example, an OLED without necessarily using a technically complex and costly photolithography process. Moreover, ablation debris can be removed with removing the protective material, thereby reducing the probability of unwanted effects like unwanted shortcuts in the OLED caused by unwanted debris.