PVD Chamber Isolator Ring Clamp Design
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Solution Overview
Problem
Physical vapor deposition (PVD) chamber isolator rings often stick to the target o-ring during chamber opening, leading to damage or breakage, which is costly and critical for chamber performance.
Innovation Solution
The use of clamps with an outwardly extending shelf and a central opening to securely clamp the isolator ring to the upper chamber adapter, preventing sticking and damage, and optionally incorporating a chamfered target assembly to increase high voltage creepage distance and reduce particle flaking.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the isolator ring is left unclamped during chamber opening, then the chamber can be opened easily, but the isolator ring gets stuck to the target o-ring and may break or damage other components
Solution Approach 1:
The clamp is installed on the isolator ring before chamber opening operations. This preliminary action secures the isolator ring to the chamber body, preventing it from getting stuck to the target o-ring during chamber opening, thereby resolving the contradiction between ease of operation and isolator ring stability
Solution Approach 2:
The clamp acts as an intermediary component between the isolator ring and the chamber body. It provides a mechanical connection that prevents direct contact between the isolator ring and the target o-ring, eliminating the sticking problem while maintaining ease of chamber opening
2Reliability
If the isolator ring is securely clamped to prevent sticking, then component damage is prevented, but the device complexity increases
Solution Approach 1:
The clamp is designed as a separate, modular component that can be independently installed and removed. This segmentation allows the clamping function to be added without redesigning the entire chamber structure, thus increasing reliability while minimizing the increase in overall device complexity
Solution Approach 2:
The clamp serves as a simple intermediary component with a straightforward mechanical design. By using a basic clamping mechanism rather than a complex system, the patent achieves component protection while keeping the added complexity minimal
Data Source
AI summary
Apparatus for physical vapor deposition are provided herein. In some embodiments, a clamp for use in a physical vapor deposition (PVD) chamber includes a clamp body and an outwardly extending shelf that extends from the clamp body, wherein the outwardly extending shelf includes a clamping surface configured to clamp an isolator ring to a chamber body of the PVD chamber, wherein a height of the outwardly extending shelf is about 15 percent to about 40 percent of a height of the clamp body and wherein the clamp body includes a central opening configured to retain a fastener therein.


