Quantum Dot Display Substrate Wettability Patterning
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Solution Overview
Problem
Current quantum dot color filter manufacturing processes require the use of banks for patterning, which can lead to color mixing and inefficiencies in display substrate production.
Innovation Solution
A method of manufacturing a display substrate that involves forming a first and second material layer with varying wettability to quantum dot solutions, allowing for the patterning of quantum dot color filters without the need for banks, by creating a first color filter sublayer on the second material layer with greater wettability and a second color filter sublayer on the first material layer with lesser wettability, and optionally using surface treatments like CFx plasma to enhance hydrophobicity and hydrophilicity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If banks are used for patterning quantum dot color filters, then color mixing is prevented, but device complexity and manufacturing steps increase
Solution Approach 1:
The invention removes the bank structure from the device by transferring the patterning function to the material layers themselves. The first and second material layers with different wettabilities replace the physical bank structure, eliminating the need for separate patterning components while maintaining precise quantum dot color filter formation.
Solution Approach 2:
The material layers perform self-patterning through differential wettability to the quantum dot solution. The second material layer with greater wettability attracts and confines the quantum dot solution to specific regions, while the first material layer with lesser wettability prevents spreading, creating precise patterns without external bank structures.
2Manufacturing precision
If banks are used for patterning, then color mixing is prevented, but manufacturing time and efficiency decrease
Solution Approach 1:
The invention eliminates the bank structure and its associated manufacturing steps. By embedding the patterning function directly in the material layers through differential wettability, the process removes multiple fabrication steps including bank formation, alignment, and assembly, significantly reducing manufacturing time while maintaining precision.
Solution Approach 2:
The invention combines the patterning function with the existing material layers (first and second material layers) rather than treating it as a separate process. This integration allows quantum dot solution deposition to simultaneously achieve both material placement and pattern formation in a single step, improving manufacturing efficiency.
3Manufacturing precision
If surface treatment is applied to enhance wettability differences, then patterning precision improves, but process steps increase
Solution Approach 1:
The invention modifies the surface energy parameters of the material layers through CFx plasma treatment to create differential wettability. This parameter change transforms the surface properties of the second material layer to have greater affinity for the quantum dot solution compared to the first material layer, enabling precise self-patterning without complex additional structures.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise patterning of quantum dot color filters, improving display substrate performance by avoiding color mixing and enhancing manufacturing efficiency without the need for banks, thereby improving the color gamut and overall display quality.
Implementation Method 1
wettability of the second material layer to the first quantum dot solution is greater than the wettability of the first material layer to the first quantum dot solution
Implementation Method 2
the surface treatment is performed using CFx plasma
Data Source
AI summary
The present disclosure relates to a display substrate and a manufacturing method thereof, and a display device. The display substrate includes a plurality of pixel units each including a first sub-pixel and a second sub-pixel. The method includes: forming a first material layer and a patterned second material layer, the first material layer including a portion corresponding to an area between the first and second sub-pixels, and the second material layer has a first opening exposing the portion of the first material layer, corresponding to the area between the first and second sub-pixels; and forming a first quantum dot solution in a first area corresponding to the first sub-pixel, on the second material layer to form a first color filter sublayer, wherein wettability of the second material layer to the first quantum dot solution is greater than wettability of the first material layer to the first quantum dot solution.