Quencher Salt Resist Composition for High-Resolution Patterns
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Solution Overview
Problem
Existing resist compositions fail to produce resist patterns with sufficient resolution and are not produced in high yield.
Innovation Solution
A salt represented by formula (I) is used in a resist composition, which includes a quencher, a resin with an acid-labile group, and an acid generator, along with specific structural units and acid generators to enhance pattern resolution and yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional salt is used in the resist composition, then the resist pattern can be formed, but the resolution of the resist pattern is insufficient
Solution Approach 1:
The patent applies parameter changes by modifying the chemical structure of the salt component in the resist composition. Specifically, it uses a salt containing a carboxylic acid group and a hydroxyl group with specific structural parameters (formula I with defined R1-R5 groups and m3-m5 values). This structural parameter optimization enables the salt to effectively control acid diffusion during the exposure process, thereby achieving high-resolution resist patterns while maintaining reliable pattern formation.
2Productivity
If the salt production method is not optimized, then the production process is simple, but the yield of the salt is low
Solution Approach 1:
The patent applies preliminary action by pre-selecting and optimizing the reactants and reaction conditions for salt production before actual manufacturing. The method specifies particular starting materials and reaction parameters that, when prepared in advance, enable high-yield salt production. This preliminary optimization of the synthesis pathway ensures that when production occurs, it achieves both high yield and operational simplicity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition using the salt (I) achieves improved resolution and high yield in resist pattern production.
Implementation Method 1
a step of exposing the composition layer
Implementation Method 2
an acid generator
Implementation Method 3
A salt represented by formula (I)... a quencher comprising the salt
Data Source
AI summary
Disclosed are a salt represented by formula (I), and a method for producing the salt, and a quencher and a resist composition comprising the same:wherein R1 and R2 each represent a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; R3, R4 and R5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; m3 represents an integer of 0 to 2, and when m3 is 2, two R3 may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and/or m5 is/are 2 or more, a plurality of R4 and/or a plurality of R5 may be the same or different from each other.