Gas-Phase Reactor Cleaning Diffuser for Uniform Film Deposition

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Solution Overview

Problem

Gas-phase reactor systems face challenges in efficiently cleaning the interior surfaces of reaction chambers, leading to non-uniform layer deposition, particle formation, and damage during the cleaning process, which prolongs fabrication time and increases costs.

Innovation Solution

A reactor system with a reaction chamber divided into upper and lower portions, a gas distribution device, a susceptor, and multiple cleaning gas diffusers with injector portions that provide a cleaning reactant to the chamber, allowing for rapid cleaning of surfaces by moving the susceptor and using inert gases to mitigate reactant interaction.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional cleaning processes are used to clean surfaces within the reaction chamber, then cleaning effectiveness is improved, but cleaning time increases significantly

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidcleaning time

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The patent replaces traditional mechanical or chemical cleaning methods with a gas-phase plasma cleaning process. The plasma reactor uses reactive ion bombardment and chemical reactions to clean surfaces, eliminating the need for manual intervention or lengthy chemical cleaning cycles while maintaining effective cleaning of the reaction chamber surfaces.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention utilizes phase transitions of cleaning materials from solid/liquid to gas phase, and subsequently to plasma state. The cleaning process employs gas-phase reactants that transition into reactive plasma species, enabling rapid surface cleaning through chemical reactions and physical bombardment, thereby reducing cleaning time while maintaining effectiveness.

Inventive Principle:

Principle #36Phase transitions

2Reliability

If cleaning processes are extended to cover all surfaces within the reaction chamber, then cleaning completeness is improved, but process time and complexity increase

Engineering Contradiction:

Improvecleaning completenessVSAvoidcleaning system complexity

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The plasma cleaning system is designed to perform multiple cleaning functions simultaneously. The same plasma reactor and gas delivery system can clean different surfaces (substrate, chamber walls, susceptor) using the same fundamental mechanism, eliminating the need for separate cleaning systems for each surface type and reducing overall system complexity.

Inventive Principle:

Principle #6Universality (Multi-functionality)

Solution Approach 2:

The cleaning process is designed to be self-contained within the existing reactor system. The plasma reactor uses its own gas delivery infrastructure and power supply to perform cleaning operations, eliminating the need for external cleaning equipment or complex multi-system integration, thereby reducing device complexity while achieving complete surface coverage.

Inventive Principle:

Principle #25Self-service

3Reliability

If intensive cleaning processes are applied to remove all deposits, then cleaning effectiveness is improved, but damage to reaction chamber surfaces increases

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidsurface damage

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent employs controlled changes in plasma parameters (power, gas flow rate, pressure, treatment time) to optimize the cleaning process. By carefully adjusting these parameters, the system achieves effective contaminant removal while maintaining surface integrity, preventing excessive etching or damage to the reaction chamber surfaces through precise parameter control.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system significantly reduces cleaning time, minimizes particle formation, and enhances the uniformity of deposited films while reducing damage to reaction chamber surfaces during the cleaning process.

Implementation Method 1

providing a cleaning reactant from the cleaning reactant source to the lower chamber portion to clean the susceptor and the lower chamber portion

Methodology Applied

Scientific EffectChemical reactions: Chemical Bonding

Implementation Method 2

using inert gases to mitigate reactant interaction

Methodology Applied

Scientific EffectGas flow: Convection

Data Source

PatentUS20230089167A1Gas-phase reactor system and method of cleaning same

Publication Date: 2023.03.23 ASM IP HLDG BV

AI summary

Gas-phase reactor systems and methods of cleaning same are disclosed. Exemplary systems include a cleaning gas diffuser within a reaction chamber to facilitate cleaning of components, such as a susceptor, within the reaction chamber. The cleaning gas diffuser can be configured to provide a flow of a cleaning reactant over one or more surfaces within the reaction chamber.