Recessed Nozzle Device for Uniform Electroplating
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Solution Overview
Problem
Conventional nozzle devices for jet electroplating processes suffer from uneven electric field distribution and high shear stress, leading to inefficiencies and non-uniformity in plating or etching processes.
Innovation Solution
A nozzle device with a recessed bottom surface and a second electrode positioned within the recess, which improves the evenness of the electric field distribution and reduces shear stress by providing a buffer space for the electrolytic solution, allowing for more uniform plating or etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the electrolytic solution is converged by the conventional nozzle to a selected region of the workpiece, then the plating process can be rapidly implemented on the selected region, but the selected region is subjected to relatively high shear stress and the electrolytic solution may have an uneven electric field distribution
Solution Approach 1:
The nozzle body is segmented into an upper section and a lower tapered section, with the electrolytic solution flow path divided into corresponding upper and lower sections. This segmentation allows the flow to be gradually converged, reducing sudden shear stress while maintaining plating efficiency. The tapered transition section acts as an intermediate zone that smoothly connects the upper and lower sections, ensuring uniform flow distribution and electric field distribution at the outlet.
Solution Approach 2:
The invention introduces a depth dimension by creating a recessed bottom surface with a second electrode positioned within it. This three-dimensional electrode arrangement transforms the traditional planar electrode configuration into a spatial structure that promotes more uniform electric field distribution across the plating area, thereby improving plating uniformity while maintaining high productivity.
2Productivity
If the electrolytic solution is converged to a selected region, then rapid plating can be achieved, but high shear stress is applied to the workpiece
Solution Approach 1:
The flow path is segmented into upper and lower sections with a tapered transition zone. This segmentation allows the electrolytic solution to gradually converge rather than being abruptly focused, thereby maintaining high plating speed while reducing the peak shear stress applied to the workpiece surface.
Solution Approach 2:
The tapered lower section of the nozzle body acts as a cushioning zone that gradually transitions the flow from the upper section to the outlet. This pre-cushioning of the flow prevents sudden high shear stress from being applied to the workpiece, while still achieving the necessary flow convergence for rapid plating.
3Device complexity
If the conventional nozzle structure is used, then the device complexity is low, but the electric field distribution is uneven
Solution Approach 1:
The invention introduces a depth dimension by creating a recessed bottom surface with a second electrode positioned within it. This three-dimensional electrode arrangement transforms the traditional planar electrode configuration into a spatial structure that promotes more uniform electric field distribution across the plating area, thereby improving plating uniformity while maintaining relatively simple device complexity.
Solution Approach 2:
The second electrode is selectively positioned in the recessed bottom surface area, creating a localized enhancement of electric field uniformity where it is most needed. This local quality improvement allows for better overall electric field distribution without requiring complete redesign of the entire nozzle structure, thus maintaining reasonable device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution results in improved plating or etching efficiency and uniformity, with a dense metal layer structure and increased proportion of inert particles, enhancing the hardness, wear-resistance, and etch-resistance of the deposited layer.
Implementation Method 1
a longitudinal channel extending downwardly from the top surface along the longitudinal axis to be in fluid communication with the recess
Implementation Method 2
an electrolytic solution may have a more even electric field distribution between the first and second electrodes
Data Source
AI summary
A nozzle device includes a nozzle body and at least one second electrode. The nozzle body extends along a longitudinal axis, and has a top surface, a bottom surface for confronting a first electrode of a workpiece, a recess provided in the bottom surface, and a longitudinal channel extending downwardly from the top surface along the longitudinal axis to be in fluid communication with the recess. The longitudinal channel has an upper section and a lower tapered section which is tapered downwardly to form a lower communication port. The least one second electrode is disposed in the recess for being spaced apart from the first electrode.