Recessed Support Features in Imprint Lithography Chucks
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Solution Overview
Problem
In nano-fabrication processes, particularly in imprint lithography, the downward deflection of templates during separation from substrates can cause edge contact, leading to particulation and stress, which affects pattern transfer accuracy and increases separation forces.
Innovation Solution
The use of recessed support features in chucks for both templates and substrates, along with a pressure system controlling zones, minimizes deflection and stress by providing physical clearance and maintaining a convex shape during imprinting and separation, reducing the need for high separation forces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If templates are pressed against substrates during imprint lithography, then pattern transfer is achieved, but downward deflection causes edge contact and particulation
Solution Approach 1:
The patent introduces a vertical dimension to the support structure by creating recessed regions in the chuck that extend downward. This dimensional change allows the template to be supported from below in a recessed area, positioning it above the substrate plane during pressing operations, thereby preventing edge contact while maintaining pattern transfer accuracy
Solution Approach 2:
The recessed support structure acts as an intermediary element between the template and the substrate. By providing support in a recessed region, it mediates the interaction between template and substrate, preventing direct edge contact that would cause particulation while still enabling effective pattern transfer through the formable layer
2Ease of operation
If high separation forces are applied to separate template from substrate, then separation is achieved, but stress and edge contact increase
Solution Approach 1:
By creating vertical recesses in the chuck structure, the template is positioned in a lowered region that maintains clearance from the substrate during separation. This dimensional arrangement allows the template to be pulled away from the substrate without the edges contacting, enabling separation with reduced forces and stress
Solution Approach 2:
The recessed support structure preliminarily prevents edge contact by maintaining spatial separation between the template edges and substrate during the separation process. This preliminary anti-action against potential edge contact reduces the stress and forces required for separation
3Stability of the object's composition
If templates are supported at the edges during imprinting, then stability is improved, but deflection varies causing pattern thickness variations
Solution Approach 1:
The patent applies local quality by creating recessed support regions at specific locations in the chuck where the template requires support. By providing support only in these localized recessed areas rather than across the entire template edge, the structure maintains stability while minimizing deflection variations that would affect pattern thickness uniformity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces variations in pattern thickness, minimizes edge contact, and decreases the magnitude of separation forces required, enhancing the precision and efficiency of nano-fabrication processes.
Implementation Method 1
a pressure system controlling zones, minimizes deflection and stress by providing physical clearance and maintaining a convex shape during imprinting and separation
Implementation Method 2
Two suction lines lead to the volume inside the inner and outer rims
Data Source
Figure 1~3
Figure 4
Figure 5A~5C
AI summary
In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.