Chuck With Removable Insert For Combined Wafer And Photomask Inspection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current microscopic inspection systems require separate setups for wafer and photomask inspections due to their different dimensions and properties, leading to increased costs and potential damage to the inspection system when switching between them.
Innovation Solution
A chuck with a removable insert that can be configured to support either a wafer or a photomask, allowing the same inspection system to operate in two modes without the need for manual changes or adjustments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If separate microscopic inspection systems are used for wafers and photomasks, then each system can be optimized for its specific specimen type, but the cost increases and the complexity of maintaining multiple systems worsens
Solution Approach 1:
The chuck is designed with a removable insert mechanism that allows it to accommodate both wafers and photomasks. The insert can be removed to create a recess for photomasks or kept in place for wafer inspection, enabling a single inspection system to perform both functions without requiring separate dedicated systems for each specimen type.
2Adaptability or versatility
If manual chuck changes are performed between wafer and photomask inspections, then the inspection system can be adapted to different specimen types, but the risk of damage to components increases and the time required for switching worsens
Solution Approach 1:
The chuck incorporates a removable insert that can be quickly added or removed based on the specimen type. This dynamic configuration allows operators to switch between wafer and photomask inspection modes by simply inserting or removing the insert, rather than performing complex manual adjustments or replacing entire chucks, thereby reducing switching time and minimizing damage risk.
3Adaptability or versatility
If manual adjustments are made when changing chucks, then the inspection system can be reconfigured for different specimen types, but the operator skill requirement increases and the potential for error worsens
Solution Approach 1:
The chuck is pre-configured with a removable insert design that anticipates the need for different specimen types. The insert is specifically shaped and dimensioned to automatically position wafers or photomasks at the correct height and location when inserted, eliminating the need for operators to perform complex manual adjustments such as refocusing objectives or reattaching vacuum connections, thereby reducing skill requirements and minimizing errors.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and cost-effective combined inspection of wafers and photomasks by reducing the need for separate inspection systems and minimizing the risk of damage during mode changes.
Implementation Method 1
An illumination system is provided which provides illumination for both the wafer and the photomask
Implementation Method 2
A detection system is provided which detects both the wafer and the photomask
Data Source
Figure 1A
Figure 1B
Figure 2A
AI summary
Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.