Radiation-Sensitive Resin Composition for CDU and LWR Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing radiation-sensitive resin compositions fail to provide sufficient Critical Dimension Uniformity (CDU), Mask Error Enhancement Factor (MEEF), and Line Width Roughness (LWR) properties, especially with next-generation exposing technologies.
Innovation Solution
A radiation-sensitive resin composition comprising a combination of at least two specific acid generators, each represented by certain chemical structures, along with a solvent and a resin containing acid-dissociable groups, enhances CDU, MEEF, and LWR properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single acid generator is used in the radiation-sensitive resin composition, then the composition can be simple in formulation, but it fails to provide sufficient CDU, MEEF, and LWR properties
Solution Approach 1:
The patent combines multiple acid generators with different molecular structures (specifically compounds of formulae 1-3 with different Z+ cations) into a single radiation-sensitive resin composition. This merging of multiple acid-generating components works synergistically to provide sufficient CDU, MEEF, and LWR properties that cannot be achieved with a single acid generator alone.
Solution Approach 2:
The patent creates a composite acid generator system by formulating a mixture of different acid generator compounds (formulae 1-3) with specific structural characteristics. This composite approach leverages the complementary properties of different acid generators to achieve superior resist performance in terms of critical dimension uniformity, mask error enhancement factor, and line width roughness.
2Productivity
If the absorption of radioactive ray in the aromatic structure is increased, then the sensitivity of the resist composition is improved, but it becomes difficult to form desired fine shape of pattern
Solution Approach 1:
The patent changes the chemical structural parameters of the acid generator molecules by introducing fluorine atoms at specific positions (X11, X12, X21, X22, X31, X32) and varying the cyclic groups (R1, R2, R3). This structural parameter optimization reduces excessive radioactive ray absorption in aromatic structures while maintaining sufficient sensitivity and enabling precise fine pattern formation.
3Reliability
If a photoacid generator with sufficient acid intensity is used for deprotection of alicyclic structure, then the deprotection reaction proceeds effectively, but the acid diffusion length and acidity cannot be optimized synergistically for all resist properties
Solution Approach 1:
The patent applies local quality by designing acid generators with specific structural features (formulae 1-3) where fluorine atoms are positioned at specific locations (X11-X32) and cyclic groups (R1-R3) are strategically selected. This localized structural optimization enables effective deprotection of alicyclic structures while controlling acid diffusion length and acidity to achieve uniform resist properties across different performance metrics.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved CDU, MEEF, and LWR properties by optimizing acid diffusion length and acidity synergistically, resulting in high-quality resist patterns.
Implementation Method 1
generating an acid by irradiating the coating of the resist composition with a radioactive ray through a mask pattern
Implementation Method 2
reacting in the presence of the acid as a catalyst to generate the difference of solubility of a resin into an alkaline or organic developer between an exposed part and a non-exposed part
Data Source
AI summary
A radiation-sensitive resin composition, includes: a base resin including a structure unit having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. The radiation-sensitive acid generator includes at least two of compounds selected from the group consisting of a compound represented by formula (1), a compound represented by formula (2), and a compound represented by formula (3), provided that the compound represented by the formula (1) and the compound represented by the formula (3) within the scope of the compound represented by the formula (2) are excluded. R1, R2 and R3 are each independently a group having a cyclic structure provided that at least one of R1, R2 and R3 is a hetero atom-containing alicyclic group in which a carbon ring atom of an alicyclic hydrocarbon group is replaced with a hetero atom, and the hereto atom-containing alicyclic group comprises a cyclic acetal structure.