Resist Composition Acid Diffusion Control
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Solution Overview
Problem
Current EUV resist materials face challenges in achieving high sensitivity while maintaining low line width roughness (LWR) and critical dimension uniformity (CDU) due to the tradeoff between sensitivity and acid diffusion, which is exacerbated by the difficulty in fully suppressing acid diffusion with existing acid generators.
Innovation Solution
A resist composition incorporating a sulfonium or iodonium salt with a sulfonic acid anion having a cyclic structure and a fluorosulfonic acid site, linked via specific groups such as —N(R2)—C(═O)—O— or —N(R2)—C(═S)—O—, effectively controls acid diffusion through hydrogen bonding, enhancing sensitivity and LWR/CDU without compromising resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the acid diffusion distance is reduced to improve LWR or CDU, then sensitivity becomes lower
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by introducing fluorosulfonic acid groups and specific linker structures (—N(R2)—C(═O)—O—, —N(R2)—C(═S)—O—, etc.) to modify acid diffusion characteristics. This allows reducing acid diffusion distance while maintaining sufficient acid generation efficiency, thereby improving LWR without significantly sacrificing sensitivity.
Solution Approach 2:
The patent uses a composite acid generator structure combining a sulfonic acid anion with a cyclic structure and fluorosulfonic acid site, linked via specific linking groups. This composite structure achieves both controlled acid diffusion (improving LWR/CDU) and high acid generation efficiency (maintaining sensitivity) by integrating multiple functional elements into one molecule.
2Manufacturing precision
If the PEB temperature is lowered to improve LWR or CDU, then sensitivity becomes lower
Solution Approach 1:
The patent changes the chemical parameters of the acid generator to achieve controlled acid diffusion at lower PEB temperatures. The fluorosulfonic acid site and specific linker structures enable sufficient acid generation and controlled diffusion even at reduced temperatures, allowing LWR improvement without significant sensitivity loss.
3Manufacturing precision
If the amount of quencher added is increased to improve LWR or CDU, then sensitivity becomes lower
Solution Approach 1:
The patent changes the chemical parameters of the acid generator itself rather than adjusting quencher amount. The fluorosulfonic acid site and specific molecular structure enable controlled acid diffusion intrinsic to the acid generator, achieving LWR improvement without needing to increase quencher concentration that would reduce sensitivity.
4Manufacturing precision
If existing acid generators are used to suppress acid diffusion, then it is difficult to fully suppress acid diffusion
Solution Approach 1:
The patent fundamentally changes the chemical parameters of the acid generator by introducing fluorosulfonic acid groups and specific linker structures (—N(R2)—C(═O)—O—, —N(R2)—C(═S)—O—, etc.). These structural modifications enable much stronger acid diffusion suppression compared to conventional acid generators, achieving minimal LWR while maintaining high sensitivity.
Solution Approach 2:
The patent employs a composite acid generator structure integrating a sulfonic acid anion with cyclic structure, fluorosulfonic acid site, and specific linking groups. This composite design achieves superior acid diffusion control that existing acid generators cannot attain, fully suppressing acid diffusion to minimize LWR.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high sensitivity, improved LWR, and CDU, maintaining resolution by controlling acid diffusion and increasing acid generation efficiency, thus addressing the tradeoff limitations of prior art.
Implementation Method 1
an acid generator having the formula (1) or (2)... capable of generating a sulfonic acid bound to a polymer backbone upon light exposure
Implementation Method 2
the diffusion of generated acid... As the acid diffusion distance is reduced, LWR or CDU is improved
Implementation Method 3
The EUV resist material must meet high sensitivity, high resolution and low LWR at the same time
Data Source
AI summary
A resist composition contains an acid generator which is a sulfonium or iodonium salt containing a sulfonic acid anion having a cyclic structure and a fluorosulfonic acid site which are linked by a linker. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.