Resist Composition Acid Diffusion Control via Aliphatic Cyclic Units
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Solution Overview
Problem
There is a need for improved acid diffusion control and lithography properties in resist compositions, particularly in EUV exposure, where existing methods compromise solubility and resolution due to increased hydrophobicity from protective groups like aromatic, norbornene, or adamantyl structures.
Innovation Solution
A resist composition incorporating a base component with a specific structural unit that generates acid upon exposure, featuring an acid diffusion control agent with an acid dissociation constant of 1.5 or more, and optionally including a cation moiety with an electron withdrawing group, to control acid diffusion and solubility in developing solutions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If protective groups or structural units containing aromatic groups, norbornene groups, or adamantyl groups are introduced to raise the glass transition temperature (Tg) of the polymeric compound, then the Tg is improved, but the hydrophobicity is increased, causing decrease in dissolution rate and deterioration of resolution and LWR
Solution Approach 1:
The patent changes the chemical structure parameters of the polymeric compound by introducing specific structural units (formula a0) with controlled hydrophobicity and Tg contribution. Instead of using traditional aromatic/norbornene/adamantyl groups, the invention uses aliphatic cyclic hydrocarbon groups with specific carbon atom counts (5-25 carbons) to achieve Tg elevation without excessive hydrophobicity increase, thereby maintaining dissolution rate and resolution.
2Manufacturing precision
If acid diffusion control is improved by changing the anion structure of the acid generator to short acid diffusion length structures, then acid diffusion control is improved, but the solubility in developing solution decreases, causing deterioration of resolution and LWR
Solution Approach 1:
The patent applies local quality by designing the polymeric compound with specific structural units (formula a0) that provide localized acid diffusion control through their molecular structure, while maintaining overall chain flexibility and solubility. The structural units with 5-25 carbon atoms in cyclic hydrocarbon groups create localized steric effects that control acid diffusion without making the entire polymer chain overly hydrophobic.
3Manufacturing precision
If the structure of polymeric compounds is variously changed to control acid diffusion, then acid diffusion control is improved, but the reactivity to acid and solubility in developing solution are compromised
Solution Approach 1:
The patent creates a composite structural design within the polymeric compound by combining multiple functional elements: structural units (formula a0) with specific cyclic hydrocarbon groups for acid diffusion control, along with other necessary functional groups for acid reactivity and solubility. This composite approach allows simultaneous optimization of acid diffusion control, acid reactivity, and developing solution solubility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves good control of acid diffusion and excellent lithography properties, enhancing pattern formation and resolution while maintaining etching resistance and reducing line edge roughness.
Implementation Method 1
a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid
Implementation Method 2
an acid diffusion control agent (D), the base component (A) including a structural unit (a0)... and the acid diffusion control agent (D) containing an acid which exhibits an acid dissociation constant of 1.5 or more
Data Source
AI summary
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.