Resist Composition with Composite Resin for Wide Focus Margin
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Solution Overview
Problem
Conventional resist compositions often fail to achieve satisfactory focus margin and are prone to defects during the production of resist patterns.
Innovation Solution
A resist composition comprising a resin with specific structural units, an acid generator, and a salt with a particular anion, applied in a method involving application, drying, exposure, and development, to produce a resist pattern with improved focus margin and reduced defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then manufacturing process is simple, but focus margin is insufficient and defects increase
Solution Approach 1:
The patent uses a composite resin system comprising multiple specific components: a polymer obtained by polymerizing compounds of formulas (u-A), (u-B), (u-C), and (u-D); a resin being insoluble or poorly soluble in alkali aqueous solution but becoming soluble by acid action; and a polymer obtained by polymerizing compound (u-B). This composite material approach enables both wide focus margin and reduced defects while maintaining process simplicity.
Solution Approach 2:
The patent optimizes specific parameters including the molecular weight of the polymer (weight average molecular weight: 5,000-80,000), the ratio of structural units, and the composition proportions of different resin components. These parameter optimizations achieve improved focus margin and defect reduction without complicating the manufacturing process.
2Reliability
If conventional resist composition is used, then composition structure is simple, but number of defects increases
Solution Approach 1:
The patent employs a multi-component composite resin system with specific polymers and acid-soluble resins, combined with a salt having an anion of formula (IA) and an acid generator. This composite structure significantly reduces defects while maintaining controlled composition complexity through defined component ratios and molecular weight ranges.
3Manufacturing precision
If resin with specific structural units is used, then focus margin improves, but manufacturing complexity increases
Solution Approach 1:
The patent specifies precise parameter ranges including weight average molecular weight (5,000-80,000), structural unit composition ratios, and component proportions. These controlled parameter changes achieve wide focus margin while keeping manufacturing straightforward through well-defined specification ranges rather than complex procedures.
Solution Approach 2:
The patent introduces specific structural units with defined chemical characteristics (formulas (u-A), (u-B), (u-C), (u-D) with specific R1, A1, R2 groups) into the resin system. This local quality enhancement at the molecular level improves focus margin without requiring complex manufacturing processes, as the improvement comes from material composition rather than process complexity.
Data Source
AI summary
A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA),wherein R1, A1, R2, R1A and R2A are defined in the specification.