Resist Composition Mask Error Factor Composite Resin
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Solution Overview
Problem
Conventional resist compositions with specific resin structures fail to adequately address mask error factors in resist patterns, leading to suboptimal performance.
Innovation Solution
A resist composition comprising a resin with a structural unit represented by formula (I), an acid generator, and a compound represented by formula (II), which is insoluble in alkali aqueous solutions but becomes soluble upon acid action, along with a solvent, applied in a method involving application, drying, exposure, and heating for pattern development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional resist composition containing a resin with polymer structural units (u-A) and (u-B) is used, then the resist composition can be formed, but the mask error factor (MEF) of the obtained resist pattern is not satisfied
Solution Approach 1:
The patent uses a composite resin system comprising two distinct resin components: a first resin containing polymer structural units (u-A) and (u-B), and a second resin containing polymer structural units (u-C) and (u-D). This composite material approach allows optimization of both mask error factor and resist pattern performance by combining materials with complementary properties, where each resin contributes specific characteristics to achieve the desired overall performance.
Solution Approach 2:
The patent optimizes the weight ratio between the first resin and second resin within specific ranges (0.1/9.9 to 4/6, preferably 0.5/9.5 to 2/8). By adjusting these compositional parameters, the mask error factor is improved to 0.85 or less while maintaining reliable resist pattern formation. The acid generator content is also controlled within specific ranges to achieve optimal performance.
2Manufacturing precision
If the resin composition is optimized for mask error factor, then resolution improves, but other resist pattern properties may be compromised
Solution Approach 1:
The patent designs a multi-functional resist composition where the combined resin system simultaneously achieves multiple objectives: high resolution (mask error factor of 0.85 or less), good etching resistance, and reliable pattern development. The first resin and second resin work together to provide complementary functions, ensuring that optimizing for one property does not compromise others.
Solution Approach 2:
The patent carefully controls multiple compositional parameters including the weight ratio of first resin to second resin (0.1/9.9 to 4/6), acid generator content (1-40 weight % relative to total resin), and the presence of specific polymer structural units. These parameter optimizations ensure that the resist composition achieves high resolution while maintaining balanced performance across all required resist pattern properties.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively improves the mask error factor in resist patterns, enhancing the resolution and dry etching resistance of the resulting resist patterns.
Implementation Method 1
a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid
Implementation Method 2
heating the exposed composition layer
Data Source
AI summary
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II),wherein R1, A1, A13, A14, X12, R23, R24, R25, R26, X21 and X22 are defined in the specification.