Chemically Amplified Resist Composition for Negative Tone Lithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current resist compositions for forming negative-tone patterns in lithography techniques face challenges in post-exposure stability and require improvements in lithography properties, especially when used with advanced exposure light sources like EUV, EB, and X-ray, where existing solvent developing processes are inferior to alkali developing solutions in terms of environment, apparatus, and cost.
Innovation Solution
A resist composition that includes a base component with increased solubility in an alkali developing solution under acid action, an acidic compound with a nitrogen-containing cation having a pKa value of 7 or less, and a buffer component with a nitrogen-containing cation and conjugate base, enhancing post-exposure stability and lithography properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a solvent developing process is used to form negative-type resist patterns, then the ability to form negative patterns is achieved, but the environment, apparatus, and cost become inferior compared to alkali developing solutions
Solution Approach 1:
The patent changes the chemical parameters of the developing solution by using alkali developing solutions instead of organic solvent developing solutions. This parameter change maintains the ability to form negative patterns while improving environmental compatibility, apparatus requirements, and cost-effectiveness compared to conventional solvent-based processes
Solution Approach 2:
The patent employs a chemically amplified resist composition that utilizes readily available alkali developing solutions rather than specialized organic solvents. This approach uses more economical, easily obtainable chemicals that can be disposed of or neutralized more simply, reducing overall manufacturing complexity and cost
2Manufacturing precision
If the polarity of a base resin is increased to improve lithography properties, then the solubility in organic developing solution decreases, but this results in negative-type pattern formation which is inferior to positive-type
Solution Approach 1:
The patent changes the developing solution parameter from organic solvent-based to alkali-based chemistry. This allows the base resin to maintain appropriate polarity for good lithography properties (including negative pattern formation capability) while the alkali developing solution provides the necessary solubility control, eliminating the trade-off present in organic solvent systems
Solution Approach 2:
The patent introduces alkali developing solution as an intermediary chemical system that mediates between the base resin's polarity requirements and the solubility requirements. The alkali solution acts as a compatible medium that allows both high-resolution pattern formation and proper solubility behavior, bridging the contradiction between resin polarity and developing solution compatibility
3Adaptability or versatility
If existing resist compositions are used for negative-tone developing processes, then negative patterns can be formed, but post-exposure stability of the latent image deteriorates
Solution Approach 1:
The patent uses a composite chemically amplified resist composition that combines multiple functional components: a base component with controlled solubility, an acid generator component for chemically amplification, and a buffer component to control pH. This composite formulation provides both negative pattern formation capability and improved post-exposure stability by balancing the chemical reactions that occur during and after exposure
Solution Approach 2:
The patent incorporates a buffer component that provides feedback control over the chemical environment in the resist film. The buffer maintains appropriate pH levels during and after exposure, preventing unwanted side reactions and stabilizing the latent image. This feedback mechanism ensures that the resist composition remains stable post-exposure while still enabling negative pattern formation through controlled acid-base chemistry
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves excellent post-exposure stability and improved lithography properties, enabling the formation of high-resolution patterns even after a certain period, effectively addressing the limitations of existing negative-tone developing processes.
Implementation Method 1
a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid
Implementation Method 2
an acid generator component that generates acid upon exposure
Implementation Method 3
a buffer component (K) containing a nitrogen-containing cation and a counteranion being a conjugate base for the acid having a pKa value of 0 to 5
Data Source
AI summary
A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid, and the resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; an acidic compound component (G1) including a nitrogen-containing cation having a pKa value of 7 or less and a counteranion; and a buffer component (K) including a nitrogen-containing cation and a counteranion being a conjugate base for the acid having a pKa value of 0 to 5.