Resist Composition for Thick-Film Pattern Resolution and Crack Resistance
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Solution Overview
Problem
Existing resist compositions fail to achieve sufficient resolution and often result in resist residues when forming thick-film resist patterns, particularly when using specific resin structures and acid generators.
Innovation Solution
A resist composition comprising a resin with specific structural units and an acid generator, including a structural unit represented by formula (b1), which enhances resolution and reduces resist residues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resist composition including specific resin structures (a1-1) and (a2-2) or (a2-1) and (a1-2) with triphenylsulfonium cation acid generator is used, then the resist pattern can be formed, but the resolution after development is insufficient and resist residues are generated
Solution Approach 1:
The invention changes the chemical structure parameters of the resin by specifying particular structural units (a1-1) and (a2-2) or (a2-1) and (a1-2) with defined molecular formulas and functional groups. This structural parameter optimization resolves the contradiction by achieving both sufficient resolution and minimal resist residues through precise molecular design rather than generic resin composition
Solution Approach 2:
The invention creates a composite resist composition by combining specifically designed resin structural units with triphenylsulfonium cation acid generator. The composite structure integrates multiple functional components (structural units a1-1, a2-2, or a2-1, a1-2) that work synergistically to achieve both high resolution patterning and reduced resist residues, resolving the technical contradiction through material composition optimization
2Length of stationary object
If thick-film resist pattern with 5 μm or more is fabricated using conventional resist composition, then the resist pattern can be formed, but the resolution after development is insufficient
Solution Approach 1:
The invention optimizes the chemical composition parameters of the resist material to enable thick-film formation (5 μm or more) while maintaining high resolution. The specific structural units (a1-1) and (a2-2) or (a2-1) and (a1-2) are designed with molecular weights and functional group configurations that allow thick film deposition without sacrificing patterning resolution, resolving the contradiction between film thickness and resolution
3Manufacturing precision
If resist composition with specific resin structures is used to improve resolution, then resolution after development is improved, but the formulation complexity increases
Solution Approach 1:
The invention achieves high resolution by optimizing specific parameters of the resin structure (structural units a1-1, a2-2, or a2-1, a1-2) rather than by adding multiple complex components. The parameter optimization approach (specific molecular formulas and functional group configurations) simplifies the formulation compared to multi-component systems, resolving the contradiction between resolution improvement and formulation complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition allows for the formation of resist patterns with excellent resolution and shape, along with improved crack resistance.
Implementation Method 1
acid generator (B) represented by formula (b1)... the resin (A) including a structural unit having an acid labile group
Data Source
AI summary
A resist composition that allows production of a resist pattern having excellent resolution, a favorable shape, and resistance to cracking includes resin (A) containing a structural unit having an acid labile group, and acid generator (B) represented by formula (b1). The resin (A) contains: resin (A1): a resin containing a structural unit represented by formula (a2-2) and a structural unit represented by formula (a1-1), but not containing a structural unit represented by formula (a1-2) or a structural unit represented by formula (a2-1); and resin (A2): a resin containing a structural unit represented by formula (a1-1) and a structural unit represented by formula (a2-1), but not containing a structural unit represented by formula (a1-2):