Resonator Antenna Current Balancing for Uniform Plasma Processing
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Solution Overview
Problem
Non-uniform electromagnetic fields in plasma processing chambers lead to inconsistent treatment of substrates during etching and deposition processes in semiconductor manufacturing, necessitating a solution for achieving plasma uniformity.
Innovation Solution
A resonator antenna system with a current balancing circuit, including a variable component and sensors, is used to adjust current ratios between different coil sections of the resonator antenna, ensuring a balanced electromagnetic field is delivered to the plasma chamber, thereby achieving plasma uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a resonator antenna is used to generate plasma in a processing chamber, then plasma generation capability is improved, but current imbalance between different coil sections causes non-uniform plasma distribution
Solution Approach 1:
The system employs current sensors to measure the actual current in each coil section and feeds this information back to a controller. The controller automatically adjusts the variable impedance components to balance the currents, eliminating the need for manual trial-and-error adjustment and ensuring uniform plasma distribution.
Solution Approach 2:
The patent uses variable impedance components (such as variable capacitors or inductors) in the current balancing circuit that can be dynamically adjusted during operation. This allows the system to adapt to changing plasma conditions and maintain current balance, thereby achieving uniform plasma distribution throughout the chamber.
2Manufacturing precision
If manual adjustment of current balancing circuit is used, then plasma uniformity can be improved, but system complexity and operation difficulty increase
Solution Approach 1:
The system is designed to automatically balance the currents in different coil sections without requiring manual intervention. The current sensors continuously monitor the current distribution, and the controller automatically adjusts the variable impedance components to maintain balance, making the system self-regulating and easier to operate.
Solution Approach 2:
By implementing a closed-loop feedback control system, the patent eliminates the need for complex manual adjustment procedures. The system continuously monitors current distribution and automatically makes corrections, simplifying operation while maintaining plasma uniformity.
3Power
If unequal currents flow through different coil sections, then electromagnetic field generation is improved, but non-uniform plasma treatment results
Solution Approach 1:
The patent applies different impedance values to different coil sections through variable impedance components in the current balancing circuit. This allows each coil section to have optimized local characteristics that compensate for positional variations, ensuring uniform plasma generation across the entire chamber while maintaining high electromagnetic field strength.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively balances currents in the resonator antenna sections, resulting in a uniform plasma distribution within the chamber, enhancing the consistency and quality of etching and deposition processes.
Implementation Method 1
an electromagnetic wave radiated into a plasma chamber generates an electromagnetic field within the chamber
Implementation Method 2
The generated electromagnetic field heats electrons in the chamber
Implementation Method 3
adjusting an impedance of a current balancing circuit... balancing currents in different coil sections of the resonator antenna
Implementation Method 4
The heated electrons ignite a plasma that treats the substrate in a process such as for etching, deposit, oxidation, sputtering
Implementation Method 5
The generated electromagnetic field heats electrons in the chamber
Data Source
AI summary
A resonator antenna system for a plasma processing tool includes a resonator antenna coupled to a RF source at a first point on the resonator antenna, a current balancing circuit coupled to the resonator antenna at a second point on the resonator antenna, a first current sensor coupled between the RF source and the resonator antenna, and a second current sensor coupled between the current balancing circuit and the resonator antenna. The current balancing circuit includes a variable component. The current balancing circuit is further coupled to a ground terminal.