Retargeting Edge Fragments via Process Window Simulation
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Solution Overview
Problem
In photolithographic processing, the increasing complexity and miniaturization of integrated circuits lead to challenges in faithfully reproducing layout designs onto substrates due to proximity effects and process variations, resulting in defects such as lithography hotspots, which existing resolution enhancement techniques like OPC struggle to address efficiently.
Innovation Solution
The method involves retargeting edge fragments in a layout design based on process window simulations, using CD gauges and restoring forces to balance constraints and conditions, effectively adjusting target positions to reduce CD and enclosure violations, and combining this process with OPC to improve pattern fidelity and lithographic quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If resolution enhancement techniques like OPC are used to address proximity effects and process variations, then lithographic quality is improved, but existing techniques struggle to efficiently address lithography hotspots
Solution Approach 1:
The patent segments the layout into individual edge fragments and processes them independently through retargeting. Each edge fragment is analyzed and adjusted based on its specific process window simulation results, allowing efficient identification and correction of lithography hotspots without processing the entire layout as a single unit.
Solution Approach 2:
The patent performs process window simulations and identifies lithography hotspots before the actual photolithographic manufacturing process. By predicting which edge fragments will cause defects under various process conditions (focus, dose variations), the method enables preventive retargeting adjustments to be made to the layout design in advance.
2Manufacturing precision
If retargeting adjusts target positions of edge fragments to reduce CD and enclosure violations, then manufacturing precision is improved, but the complexity of the design flow increases
Solution Approach 1:
The patent introduces an intermediary retargeting module that sits between the existing OPC process and the photolithographic manufacturing. This module takes the output from process window simulations and automatically generates retargeted layout adjustments, bridging the gap between simulation analysis and layout modification without requiring direct complex interactions between multiple design tools.
Solution Approach 2:
The retargeting system uses automated algorithms that independently analyze process window simulation data, identify edge fragments requiring adjustment, calculate optimal retargeting parameters, and generate corrected layout data without manual intervention. The system serves itself by automatically closing the loop from simulation to layout correction.
Data Source
AI summary
Aspects of the invention relate to retargeting based on process window simulation to fix hotspots. The process window simulation is performed to generate process window information. Edge fragments are selected for retargeting. Based on the process window information, the selected edge fragments are retargeted in a balanced way.