RF Feed Line Vacuum Interrupter for Plasma Chamber Fault Isolation

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Solution Overview

Problem

Existing plasma processing systems face safety risks due to fault conditions during RF signal generation, which can lead to damage to the RF generation system hardware.

Innovation Solution

A radio-frequency (RF) generation system incorporating a vacuum interrupter that selectively decouples the RF generator from the bias electrode of a plasma chamber upon detection of a fault condition, using a hardware switch to prevent damage and enhance safety.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If an RF signal is continuously provided to the plasma chamber, then plasma processing can be maintained, but the system becomes vulnerable to fault conditions that may damage the RF generation system

Engineering Contradiction:
Improvesystem safetyVSAvoidRF generation system complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

A vacuum interrupter is introduced as an intermediary component between the RF generator and the plasma chamber. This switch device acts as a mediator that can rapidly disconnect the RF signal path when fault conditions are detected, protecting the RF generation system while maintaining processing capability during normal operation.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The vacuum interrupter is pre-configured in the RF signal path between the RF generator and the plasma chamber, ready to immediately decouple the system upon detection of fault conditions such as reflected power or plasma disruptions, preventing damage before it occurs.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If a vacuum interrupter is added to decouple the RF generator from the plasma chamber, then hardware protection is improved, but the device complexity increases

Engineering Contradiction:
Improvehardware protectionVSAvoidRF generation system structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The vacuum interrupter serves as a protective intermediary component inserted into the RF feed line between the RF generator and the plasma chamber. It provides hardware protection by physically disconnecting the RF signal path when fault conditions occur, while maintaining a relatively simple integration into the existing system architecture.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively protects system hardware from fault conditions, ensuring safety and preventing damage to the RF generation system by isolating it during maintenance and fault occurrences.

Implementation Method 1

a vacuum interrupter configured to selectively decouple the RF generator from a bias electrode of a plasma chamber

Methodology Applied
Scientific EffectVacuum: Vacuum

Data Source

PatentUS11823868B2Hardware switch on main feed line in a radio frequency plasma processing chamber
Publication Date: 2023.11.21 APPLIED MATERIALS INC
  • US11823868B2 patent drawing
  • US11823868B2 patent drawing
  • US11823868B2 patent drawing

AI summary

Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a radio-frequency (RF) generation system. The RF generation system generally includes an RF generator, and a vacuum interrupter configured to selectively decouple the RF generator from a bias electrode of a plasma chamber based on detection of a fault condition associated with operation of the plasma chamber.