Robot Diagnostic Module for Semiconductor Wafer Transfer

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Solution Overview

Problem

Wafer displacement issues in semiconductor manufacturing due to heat expansion and mechanical wear in semiconductor wafer transfer equipment, leading to non-uniform film deposition and potential damage to wafers during processing and storage.

Innovation Solution

A diagnostic module with sensors installed inside or outside the semiconductor wafer transfer equipment chamber to detect and compare the position and shape of the end effector against pre-registered normal conditions, allowing for real-time diagnosis and maintenance of the equipment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If heat is applied to semiconductor wafers in processing chambers, then semiconductor wafer processing is enabled, but the tip parts of the semiconductor wafer transfer equipment undergo heat expansion causing wafer displacement

Engineering Contradiction:
Improvetemperature of semiconductor waferVSAvoidwafer position accuracy
Core Design Contradiction:
TemperatureVSManufacturing precision

Solution Approach 1:

The patent employs sensors to detect the position of the end effector and feeds this information back to a control system. The control system compares the detected position with the target position and adjusts the transfer equipment to compensate for heat expansion, thereby maintaining wafer position accuracy despite temperature changes

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent uses actuators to dynamically adjust the position of the end effector in response to detected position deviations. By changing the physical parameters (position) of the transfer equipment components, the system compensates for thermal expansion effects and maintains precise wafer placement

Inventive Principle:
Principle #35Parameter changes

2Productivity

If the semiconductor wafer transfer equipment operates for extended periods, then productivity is improved, but mechanical wear causes the stopping position of the end effector to displace

Engineering Contradiction:
Improvewafer transfer throughputVSAvoidend effector stopping position
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The sensor continuously monitors the actual position of the end effector during operation. This feedback mechanism detects position deviations caused by mechanical wear and enables real-time compensation, allowing the system to maintain precision despite extended operational periods and accumulating wear

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The diagnostic module automatically detects and reports position deviations without requiring manual intervention. The system performs self-diagnosis by comparing actual positions with expected positions, enabling proactive maintenance scheduling based on actual wear conditions rather than fixed time intervals

Inventive Principle:
Principle #25Self-service

3Manufacturing precision

If a diagnostic module with sensors is installed to detect end effector position, then wafer displacement is prevented, but device complexity increases

Engineering Contradiction:
Improvewafer placement accuracyVSAvoiddiagnostic module structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent introduces a diagnostic module as an intermediary system that includes sensors and a control unit. This separate module monitors the transfer equipment without being integrated into the core transfer mechanism, thereby enabling precise detection while keeping the main system architecture relatively simple and modular

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Prevents wafer displacement by detecting deviations in the end effector's position and shape, ensuring accurate placement and reducing the risk of wafer damage, thereby maintaining process integrity and preventing defective semiconductor wafer production.

Implementation Method 1

at least one sensor for detecting a position of the end effector when the end effector is located inside the robot diagnostic module

Methodology Applied
Scientific EffectLight reflection: Reflection

Data Source

PatentUS8666551B2Semiconductor-processing apparatus equipped with robot diagnostic module
Publication Date: 2014.03.04 ASM JAPAN
  • US8666551B2 patent drawing
  • US8666551B2 patent drawing
  • US8666551B2 patent drawing

AI summary

A semiconductor wafer manufacturing apparatus is equipped with a diagnostic module for diagnosing integrity of a transfer robot. The diagnostic module is attached to one side of a semiconductor wafer transfer chamber provided with the transfer robot, which side is also used for the purpose of maintenance, for example. One or more sensors are installed in the diagnostic module so that when the transfer robot is inserted into the diagnostic module, the position or shape of each end effector of the transfer robot is detected and compared against a pre-registered normal condition, thereby diagnosing the integrity of the end effector of the transfer robot, while performing wafer processing.