Rotary Spot Heating Assembly for Substrate Temperature Uniformity

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Solution Overview

Problem

Semiconductor substrates experience temperature non-uniformity during processing, leading to valleys in deposition, which affects the uniformity of material deposition.

Innovation Solution

A thermal process chamber equipped with a spot heating source assembly that includes a motorized rotatable radiant heating source configured to project energy through a collimator holder and rotary stage, allowing for localized heating of specific areas on the substrate by moving along an arcuate path to adjust the energy impact point.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If a stationary heating source is used, then the heating system is simple, but temperature uniformity on the substrate deteriorates

Engineering Contradiction:

Improvetemperature uniformityVSAvoidheating system complexity

Core Design Contradiction:

TemperatureVSDevice complexity

Solution Approach 1:

The heating source is made dynamic by mounting it on a rotary stage that rotates it along an arcuate path, allowing the stationary heating source to sweep across different positions and achieve uniform temperature distribution on the substrate through motion

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The collimator holder is mounted at an acute angle to direct radiant energy to specific local areas of the substrate, enabling localized heating control while maintaining overall temperature uniformity through selective regional heating

Inventive Principle:

Principle #3Local quality

2Adaptability or versatility

If the collimator holder is mounted perpendicular to the rotary stage, then the structure is simple, but the energy impact point cannot be adjusted

Engineering Contradiction:

Improveenergy impact point adjustmentVSAvoidmounting structure complexity

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The collimator holder is mounted at an acute angle (asymmetric configuration) rather than perpendicular to the rotary stage, enabling the radiant energy to be directed at adjustable angles and positions on the substrate, providing adaptability for different heating requirements

Inventive Principle:

Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enhances temperature uniformity on the substrate, improving deposition uniformity and reducing temperature non-uniformities, leading to higher substrate quality and reduced scrap rates, while also minimizing bulk and maintenance issues.

Implementation Method 1

a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window

Methodology Applied

Scientific EffectRadiant heating: Thermal Radiation

Implementation Method 2

A spot heating source assembly comprises a collimator holder and a rotary stage disposed in a first plane

Methodology Applied

Scientific EffectCollimation: Focusing

Data Source

PatentUS12261062B2Spot heating by moving a beam with horizontal rotary motion

Publication Date: 2025.03.25 APPLIED MATERIALS INC

AI summary

Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window.