Rotatable Substrate Holder Assembly for Ion Implanters
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing ion implanter designs face inefficiencies due to serial processing, which causes delays from loading and unloading wafers between each implant, and radial scanning arrangements result in non-uniform dose characteristics across the wafer due to varying scan speeds.
Innovation Solution
A substrate holder assembly with a rotatable base and support arms that allow for interchangeable positions, enabling simultaneous scanning and loading/unloading of substrates, with support arms positioned to alternate between scanning and loading/unloading positions, and allowing for variable substrate orientation and movement within the ion beam path.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If serial processing is used with a single substrate holder, then device complexity is reduced, but productivity decreases due to delays from loading and unloading substrates between implants
Solution Approach 1:
The substrate holder is divided into multiple independent holders (first substrate holder, second substrate holder, etc.) that can operate independently. Each holder can hold and process substrates separately, allowing parallel processing operations. This segmentation enables multiple substrates to be implanted simultaneously or in rapid succession without waiting for loading/unloading cycles, thereby increasing productivity while maintaining manageable device complexity through modular design.
Solution Approach 2:
Multiple substrate holders are integrated into a single ion beam path, allowing them to share the same ion source and processing environment. The holders are positioned such that they can alternately occupy the ion beam path, with one holder being processed while another is loaded or unloaded. This merging of multiple holders into a shared processing space enables continuous operation without idle time, resolving the contradiction between productivity and device complexity.
2Manufacturing precision
If radial scanning arrangement is used, then substrate scanning is achieved, but manufacturing precision deteriorates due to non-uniform dose characteristics from varying scan speeds
Solution Approach 1:
Instead of moving the substrate radially outward from a central axis (traditional radial scanning), the invention inverts the approach by having the ion beam scan linearly across the substrate surface while the substrate remains in a fixed position or moves minimally. This inversion eliminates the variable scan speed problem inherent in radial scanning, as linear scanning at constant velocity ensures uniform dose distribution. The complexity is reduced by eliminating the need for complex radial positioning mechanisms while achieving the same scanning objective.
Solution Approach 2:
The invention replaces the mechanical radial scanning system with an electromagnetic beam deflection system. Instead of mechanically moving the substrate along a radial path with varying speed, the ion beam is deflected using electromagnetic fields to scan across the substrate surface. This substitution allows for precise control of beam position and scanning velocity, ensuring uniform dose characteristics while reducing mechanical complexity. The electromagnetic control enables accurate dosing without the speed variations inherent in mechanical radial motion.
Data Source
AI summary
A substrate holding apparatus for use in ion implanters includes two or more substrate holders that can adopt interchangeable positions, thereby allowing one substrate holder to scan a substrate through an ion beam while substrates can be swapped on the other substrate holder. The substrate holder assembly includes a base rotatable about a first axis and at least two support arms extending from the base to ends provided with substrate holders. Rotating the base allows the substrate holders to move between designated positions. One designated position may correspond to a position for implanting a substrate and another designated position may correspond to a loading/unloading station.


