Rotating Cathodic Arc Target for Uniform Plasma Deposition

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Cathodic arc deposition processes face issues with non-homogeneous material removal from targets, leading to target poisoning and unusability, especially when reactive gases are used to form chemical compound coatings with poor electrical conductivity.

Innovation Solution

A cathodic arc deposition apparatus featuring a rotatable target, an anode ring, a spark device, a focus coil, and a filter coil, which generates and directs plasma pulses to ensure uniform material ejection and prevent target poisoning by creating a uniform magnetic field and focusing the plasma stream.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a cathodic arc deposition process is used to form chemical compound coatings with reactive gases, then coating quality is improved, but the target becomes poisoned and unusable due to non-homogeneous material removal

Engineering Contradiction:

Improvecoating qualityVSAvoidtarget usability

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The target is rotated during the deposition process to dynamically change the spot position on the target surface. This rotation prevents the spot from remaining stationary and causes material to be removed more homogeneously across the target surface, preventing target poisoning while maintaining coating quality

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The deposition process uses periodic pulsing of the arc discharge rather than continuous operation. This periodic action allows the spot to be reset and redistributed across the target surface during pulse intervals, preventing localized overheating and chemical compound buildup that would otherwise poison the target

Inventive Principle:

Principle #19Periodic action

2Productivity

If the spot remains at the same position on the target surface, then material removal is concentrated, but the target becomes unusable due to hole formation

Engineering Contradiction:

Improvedeposition rateVSAvoidtarget usability

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

Rotation of the target during deposition dynamically moves the spot position across the target surface, distributing material removal across multiple locations rather than concentrating it at one spot, thereby maintaining target usability while preserving deposition productivity

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The rotation mechanism acts as an intermediary between the stationary arc spot and the target surface, continuously changing the relative position to distribute the intense localized energy input across the entire target surface over time

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus ensures homogeneous material removal and extends the target's usability by maintaining a uniform plasma distribution, preventing target poisoning and ensuring consistent coating quality.

Implementation Method 1

A spark device is disposed in the chamber for generating an arc on the surface of the rotatable target. An electron arc is used to evaporate material from the target surface

Methodology Applied

Scientific EffectArc evaporation: Arc Evaporation

Implementation Method 2

At the location where the electrons are leaving the target surface (referred to as the 'spot') the surface is heated up very fast and to a high temperature

Methodology Applied

Scientific EffectJoule heating: Joule Heating

Implementation Method 3

a focus coil having a helical shape with an axis aligned with the central axis of the anode ring... A filter coil having a helical shape with an axis aligned with the central axis of the anode ring

Methodology Applied

Scientific EffectMagnetic field: Magnetic Field

Implementation Method 4

The system may be configured to direct a stream of charged particles ejected from the surface of the rotatable target through the opening of the anode ring

Methodology Applied

Scientific EffectLorentz force: Lorentz Force

Implementation Method 5

A rotatable target is disposed within the chamber... During the deposition process, the spot tends to move more or less randomly or 'dance' on the surface of the target

Methodology Applied

Scientific EffectRotational motion:

Implementation Method 6

This rapid heating and high temperature causes the material of the target to be evaporated and then condensed on the surfaces of the substrates to be coated

Methodology Applied

Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Implementation Method 7

the material of the target to be evaporated and then condensed on the surfaces of the substrates

Methodology Applied

Scientific EffectCondensation: Condensation

Data Source

PatentUS11851746B2Pulsed cathodic arc deposition

Publication Date: 2023.12.26 OERLIKON SURFACE SOLUTIONS AG PFAFFIKON

AI summary

An assembly for cathodic arc deposition of a material onto an article. The assembly includes a chamber for receiving an article to be coated and a rotating target. The rotatable target has a surface from which a plasma material is ejected. An anode ring is positioned a first distance from the surface of the rotatable target. The anode ring has an opening with a central axis that is parallel to a rotational axis of the rotatable target and offset a second distance from the rotational axis. A spark device is disposed in the chamber for generating an arc on the surface of the rotatable target. The assembly configured to direct a stream of charged particles ejected from the surface of the target through the opening of the anode ring to the article to be coated.