Rotating Arc Target Positioning for Shave-Free Film Deposition

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Solution Overview

Problem

The existing vacuum arc deposition methods for forming thin carbon protection films require shaving the target surface, leading to reduced target utilization efficiency, decreased throughput, and potential malfunctions due to shaving chips entering the rotating apparatus.

Innovation Solution

A deposition apparatus that rotates and moves a columnar target to generate an arc discharge on its side surface, allowing for even wear without shaving, thereby improving target utilization and preventing malfunctions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the target surface is shaved to maintain deposition quality, then the deposition precision is improved, but the target utilization efficiency deteriorates and the productivity decreases

Engineering Contradiction:

Improvedeposition qualityVSAvoidthroughput

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The patent replaces the mechanical shaving system with a magnetic field-based target rotation and positioning system. By using magnetic fields to control the target's rotational position and the striker's movement, the system achieves precise arc discharge positioning without mechanical contact, eliminating the need for periodic shaving operations and thereby improving productivity while maintaining deposition quality.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the operational parameters by implementing continuous target rotation and dynamic positioning during arc discharge. Instead of static target positioning followed by periodic shaving, the system continuously adjusts the target's rotational position and the striker's location, optimizing the arc discharge process throughout the target's surface and eliminating the need for shaving while maintaining deposition quality.

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If the target surface is shaved to maintain deposition quality, then the deposition precision is improved, but the loss of time increases due to the additional shaving step

Engineering Contradiction:

Improvedeposition qualityVSAvoidprocess time

Core Design Contradiction:

Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent implements continuous useful action by maintaining continuous target rotation and dynamic positioning during arc discharge throughout the deposition process. This continuous operation eliminates idle time for shaving operations, ensuring that the deposition process proceeds without interruption and reducing total process time while maintaining deposition quality through precise magnetic field-controlled positioning.

Inventive Principle:

Principle #20Continuity of useful action

3Stability of the object's composition

If the target is rotated to average out unevenness from arc spots, then the deposition uniformity is improved, but the target utilization efficiency deteriorates due to peripheral portion remaining unused

Engineering Contradiction:

Improvedeposition uniformityVSAvoidtarget utilization efficiency

Core Design Contradiction:

Stability of the object's compositionVSLoss of substance

Solution Approach 1:

The patent applies dynamics by implementing continuous target rotation during arc discharge rather than static positioning. The target rotates continuously, allowing the arc discharge to occur at different positions around the target circumference, which distributes wear evenly across the entire target surface and maximizes target utilization while maintaining deposition uniformity through dynamic positioning control via magnetic fields.

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances target utilization efficiency and maintains deposition quality without the need for shaving, reducing the risk of apparatus malfunctions and improving overall throughput.

Implementation Method 1

generating an arc discharge between the target and the anode arranged near the target. The arc discharge is generated by bringing a striker connected to the anode closer to or into contact with the target

Methodology Applied

Scientific EffectArc discharge: Electric Arc

Implementation Method 2

a rotation unit configured to rotate a target about a rotating axis... a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker

Methodology Applied

Scientific EffectRotation:

Implementation Method 3

a deposition method (vacuum arc deposition) which uses an arc discharge and can form a thinner carbon protection film

Methodology Applied

Scientific EffectVacuum arc deposition: Cathodic Arc Deposition

Data Source

PatentUS11821067B2Deposition apparatus

Publication Date: 2023.11.21 CANON ANELVA CORP

AI summary

A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.