Rotating Charging Member for Lapping Plate Particle Embedding
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Solution Overview
Problem
Existing methods for embedding abrasive particles into lapping plates are inefficient, leading to excessive slurry usage and uneven distribution, resulting in reduced particle density and increased downtime for lapping operations.
Innovation Solution
A rotatable processing head mechanism with charging members featuring channel openings and land areas that rotate and apply pressure to the lapping plate, allowing for efficient embedding of abrasive particles by recirculating slurry from the outer perimeter inward, thereby reducing slurry usage and enhancing particle density.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing methods for embedding abrasive particles are used, then the process is simple, but the particle density is reduced and slurry usage is excessive
Solution Approach 1:
The charging member is divided into multiple segments with channel openings between them, creating distinct land areas that separately control slurry flow and particle embedding zones. This segmentation allows precise delivery of slurry to specific areas, reducing overall slurry consumption while maintaining high particle density on the lapping plate surface.
Solution Approach 2:
The channel openings are positioned at specific locations (proximal to outer perimeter) to create localized slurry flow paths. This local quality enhancement ensures slurry is delivered precisely where needed for optimal particle embedding, reducing waste and improving particle density in critical areas of the lapping plate.
2Productivity
If existing charging methods are used, then the equipment is simple, but the operational efficiency is reduced and downtime increases
Solution Approach 1:
The rotatable processing head mechanism continuously rotates during the charging process, maintaining constant contact between the charging member and lapping plate surface. This continuous rotational motion ensures uniform particle embedding across the entire plate surface in a single operation, eliminating the need for multiple passes and reducing downtime between lapping operations.
Solution Approach 2:
The processing head mechanism incorporates rotation capability that transforms the static charging process into a dynamic one. The rotating motion allows the charging member to cover the entire lapping plate surface efficiently, increasing productivity by reducing the time required to achieve uniform particle distribution compared to stationary charging methods.
3Manufacturing precision
If slurry is applied without recirculation, then the process is simple, but the distribution is uneven and particle density is reduced
Solution Approach 1:
The channel openings create segmented flow paths that guide slurry from the outer perimeter inward through defined channels. This segmentation of the slurry flow path ensures uniform distribution across the lapping plate surface without requiring complex external recirculation systems, achieving even particle distribution through the geometric design of the charging member itself.
Solution Approach 2:
The channel openings act as intermediaries that mediate slurry flow from the outer perimeter to the inner areas of the lapping plate. These channels provide controlled pathways for slurry distribution, ensuring uniform particle density without the need for complex active recirculation mechanisms, thereby maintaining device simplicity while improving distribution uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces slurry usage, increases abrasive particle density on the lapping plate, and enhances operational efficiency by allowing more rows to be lapped before plate replacement, resulting in cost savings and increased capacity.
Implementation Method 1
the at least one channel opening permits abrasive slurry to flow through the channel opening from a position outside the charging member outer perimeter to a position inside the charging member outer perimeter
Implementation Method 2
the processing head mechanism is configured to move the processing head in at least the z-axis direction to contact the major surface of the lapping plate platen with the at least two land areas under pressure to charge abrasive particles into the surface
Implementation Method 3
to charge abrasive particles into the surface of the lapping plate platen
Data Source
AI summary
The present disclosure includes charging members for charging abrasive particles into the surface of a lapping plate. The charging members include one or more channels to permit abrasive slurry to flow through when the charging member is in contact with the lapping plate.