Sample Alignment via Diffraction Pattern Matching

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Solution Overview

Problem

Current methods for aligning crystalline samples in charged particle microscopes are inefficient, particularly for thin samples, as they rely on heuristic circle-fitting and dynamic diffraction models, which can fail due to dynamic diffraction effects and are not accurate enough for precise metrology, especially when sample misalignment is less than 1 degree or in thin samples like those used in the electronics industry.

Innovation Solution

A method that compares the sample diffraction pattern with reference patterns having known misalignments to determine the closest match, using a simplified kinematical model to generate reference patterns, which reduces computational burden and eliminates the need for extensive libraries, allowing for precise alignment of the sample zone axis to within 0.5 degrees without requiring multiple diffraction patterns or indexing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If circle-fitting method is used to align sample, then alignment can be achieved for some patterns, but the method fails for patterns with dynamic diffraction effects or when misalignment is less than 1 degree

Engineering Contradiction:
Improvealignment reliabilityVSAvoidapplicability to different diffraction patterns
Core Design Contradiction:
ReliabilityVSAdaptability or versatility

Solution Approach 1:

The invention changes the approach from geometric circle-fitting to intensity-based pattern matching by correlating diffraction spot intensities with simulated patterns. This parameter change enables reliable alignment for thin samples with dynamic diffraction effects and small misalignments (<1 degree) that were previously unsuitable for circle-fitting methods.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention replaces the mechanical/geometric circle-fitting approach with a computational intensity correlation method. By substituting geometric shape analysis with intensity-based pattern recognition, the system achieves universal applicability across different diffraction patterns including those affected by dynamic diffraction.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Measurement precision

If dynamic diffraction model is used, then theoretical accuracy can be achieved, but computational burden increases and extensive libraries are required

Engineering Contradiction:
Improvealignment precisionVSAvoidcomputational complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The invention uses a simplified kinematical diffraction model instead of complex dynamic diffraction simulations. This 'cheaper' computational approach generates sufficient reference patterns without requiring extensive pre-computed libraries, reducing computational burden while maintaining adequate alignment precision for thin samples.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The invention applies partial action by using only the necessary level of diffraction model complexity (kinematical rather than dynamic) sufficient for thin sample alignment. This avoids the excessive computational resources required by full dynamic diffraction models while achieving the needed measurement precision.

Inventive Principle:
Principle #16Partial or excessive action

3Ease of operation

If circle-fitting routine is used, then alignment can be performed, but it is difficult to determine accuracy of tilt measurement

Engineering Contradiction:
Improveease of alignment operationVSAvoidaccuracy of tilt measurement
Core Design Contradiction:
Ease of operationVSMeasurement precision

Solution Approach 1:

The invention introduces feedback through iterative intensity correlation, where the measured diffraction pattern is compared with simulated patterns at different tilt angles. This feedback mechanism enables determination of both the optimal alignment and the accuracy of tilt measurement, overcoming the limitation of circle-fitting routines.

Inventive Principle:
Principle #23Feedback

4Measurement precision

If multiple diffraction patterns are collected for indexing, then alignment accuracy can be improved, but processing time increases

Engineering Contradiction:
Improvealignment accuracyVSAvoidalignment processing time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The invention segments the alignment problem into intensity correlation of individual diffraction spots rather than requiring complete indexing of multiple patterns. This segmentation approach achieves accurate alignment using a single diffraction pattern, eliminating the time loss associated with collecting and processing multiple patterns for indexing.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables accurate and efficient alignment of crystalline samples by correlating lists of diffraction spots rather than images, reducing computational complexity and achieving precise alignment without the need for extensive libraries or multiple diffraction patterns, making it suitable for thin samples and improving metrological accuracy.

Implementation Method 1

Because of the wave nature of electrons, electrons that pass through a crystalline sample interfere with each other, reinforcing the electron beam in some regions and cancelling the beam in other regions. The interference forms a diffraction pattern on the back focal plane of an objective lens positioned below the sample.

Methodology Applied
Scientific EffectDiffraction: Diffraction

Data Source

PatentUS9978557B2System for orienting a sample using a diffraction pattern
Publication Date: 2018.05.22 FEI CO
  • US9978557B2 patent drawing
  • US9978557B2 patent drawing
  • US9978557B2 patent drawing

AI summary

A method and apparatus are provided for aligning a sample in a charged particle beam system. The charged particle beam is directed toward the sample to obtain a sample diffraction pattern. The sample diffraction pattern is compared with reference diffraction patterns having known misalignments to determine which reference pattern most closely matches the sample pattern. The known alignment of the best-matching reference diffraction pattern is used to correct the tilt of the sample. The “patterns” compared can be lists of bright spots with corresponding intensities rather than images.