Sealed Elastomer Bonded Si Electrodes for Reduced Particle Contamination
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Solution Overview
Problem
The existing electrode assemblies in semiconductor etching processes face erosion issues due to plasma exposure, leading to degradation and operational limitations, which affects the performance and longevity of the plasma processing system.
Innovation Solution
The electrode assembly incorporates a backing member with recesses for bonding material, spacers to maintain a gap, and a groove to trap excess material, ensuring the bonding material is confined and protected from plasma exposure, thereby preventing erosion and enhancing operational longevity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If bonding material is used to join electrode and backing member, then mechanical compliance and thermal conduction are improved, but the bonding material is exposed to plasma and radicals causing erosion and particle generation
Solution Approach 1:
The bonding material is extracted from the plasma exposure zone by using recesses in the electrode and/or backing member to contain the bonding material. This separation removes the harmful plasma-radiated bonding material interface while preserving the bonding function, thereby eliminating particle contamination without sacrificing bonding strength.
Solution Approach 2:
The electrode and backing member are designed with localized recesses at specific bonding interfaces. These recesses create a non-uniform geometry that confines bonding material to protected zones, applying the local quality principle by modifying only the bonding regions while leaving the rest of the plasma-exposed surfaces unchanged.
2Adaptability or versatility
If bonding material is exposed to plasma for electrode assembly, then electrical and thermal functions are achieved, but operational lifetime is reduced due to erosion
Solution Approach 1:
By extracting the bonding material from plasma exposure through recess containment, the erosion mechanism is eliminated while the bonding material continues to provide mechanical compliance and thermal conduction. This extends the operational lifetime of the electrode assembly without reducing its multifunctional capabilities.
Solution Approach 2:
The recess structure provides beforehand protection by containing the bonding material in a shielded position before plasma exposure occurs. This preventive design cushioning prevents direct plasma-bonding material contact, thereby preserving the bonding material integrity throughout the operational lifetime.
3Reliability
If bond material is protected from plasma exposure, then particle contamination is reduced, but the complexity of electrode assembly manufacturing increases
Solution Approach 1:
The recesses are incorporated only at the specific bonding interfaces where bonding material is applied, rather than redesigning the entire electrode structure. This localized modification maintains manufacturing simplicity while achieving the reliability benefit of protected bonding material.
Solution Approach 2:
The electrode and backing member are segmented with recesses that create distinct zones: a protected bonding material containment zone and an exposed plasma-interaction zone. This segmentation allows the bonding material to be isolated from plasma without requiring complete structural redesign, thereby limiting manufacturing complexity increase.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly reduces the erosion of bonding material, leading to extended operational lifetimes and maintaining performance stability during semiconductor substrate processing, minimizing defects like Al ball particle generation.
Implementation Method 1
the bonding material is confined to the at least one recess
Data Source
Figure 1
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Figure 4~5
AI summary
Disclosed is an electrode assembly (200) for a plasma reaction chamber used in semiconductor substrate processing comprising a backing member (230) having a bonding surface (227), the backing member (230); an electrode (220) having a lower surface on one side and a bonding surface (225) on the other side; wherein either the backing member (230) or the electrode has a recess. The bonding material (160) is confined to the at least one recess (280) or at least one spacer (281) is provided to maintain a gap between the bonding surfaces of the backing member and the electrode, and a bonding material (160) between the bonding surfaces (225, 282) of the backing member (230) and the electrode (220). A method of manufacturing an electrode assembly is further disclosed.