Segmented Coil Reaction Chamber for Plasma Uniformity
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Solution Overview
Problem
In existing TSV interconnection technology, the high power required for remote high density plasma generation leads to increased skin current, reduced effective power for plasma generation, and enhanced effects like recombination and ion bombardment, which can cause dielectric window cracking due to temperature rise and gradient.
Innovation Solution
A reaction chamber with multiple coils arranged vertically around the dielectric window, connected in parallel with matching power supplies to reduce skin current effects and enhance plasma ionization, ensuring uniform plasma distribution and reduced thermal stress on the dielectric window.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If higher power is supplied to the coil to increase plasma density for high etching rate, then etching rate is improved, but skin current increases and effective power for plasma generation is reduced
Solution Approach 1:
The single coil structure is segmented into multiple coils arranged in parallel. This segmentation distributes the total current across multiple coil windings, reducing the skin current effect in each individual coil while maintaining the overall plasma density required for high etching rates.
2Productivity
If higher power is supplied to the coil to achieve high plasma density, then etching rate is improved, but temperature rise and temperature gradient of the dielectric window increase causing cracking
Solution Approach 1:
The coil system is divided into multiple parallel coils, which distributes the power input and reduces the intensity of localized heating effects. This segmentation helps control the temperature rise and gradient in the dielectric window, preventing thermal cracking while maintaining sufficient plasma density for high etching rates.
3Device complexity
If single set of coil is used to generate plasma, then device complexity is low, but skin current effect reduces effective power and plasma uniformity
Solution Approach 1:
The coil system is divided into multiple parallel coils, which distributes the power input and reduces the intensity of localized heating effects. This segmentation helps control the temperature rise and gradient in the dielectric window, preventing thermal cracking while maintaining sufficient plasma density for high etching rates.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration improves plasma density and uniformity, reduces the risk of dielectric window cracking, and prolongs its service life by optimizing power usage and minimizing thermal stress.
Implementation Method 1
the coil generates an electromagnetic field in the reaction chamber 1, which excites process gas introduced into the reaction chamber 1 into plasma
Implementation Method 2
the second power supply 6 is electrically connected to the electrostatic chuck 2, and is used for supplying power to the electrostatic chuck 2 to generate a bias voltage on the electrostatic chuck 2, so as to attract the plasma to bombard the wafer
Implementation Method 3
because skin current resulted from skin effect increases rapidly and has a direction opposite to that of current in the coil 4, a part of the power supplied to the coil 4 by the first power supply 5 is consumed
Implementation Method 4
so as to attract the plasma to bombard the wafer placed on the electrostatic chuck 2, so that a physical reaction and/or a chemical reaction happens between the plasma and the wafer
Data Source
AI summary
A reaction chamber is provided. The reaction chamber includes a chamber body, a dielectric window, and a power supplier. The dielectric window is provided on top of the chamber body along a first direction and hermetically connected with the chamber body. Each coil of a plurality of sets of coils is wound around an outer surface of the dielectric window at an interval along the first direction. The plurality of sets of coils are connected in parallel, with first ends electrically coupled to the power supplier for supplying power to each set of the plurality of sets of coils, and with second ends grounded. The second ends of the plurality of sets of coils are arranged in proximity between the first ends.