Segmented Gate Electrode Parasitic Capacitance Reduction

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Solution Overview

Problem

In semiconductor devices like IGBTs, parasitic capacitance between the emitter, collector, and gate electrodes affects switching rate and switching losses, requiring a reduction in parasitic capacitance to improve switching characteristics.

Innovation Solution

The semiconductor device features a gate electrode with varying lengths, where a shorter gate electrode length is used in regions between emitter regions, reducing parasitic capacitance without significantly impacting current flow, thereby enhancing switching performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If the gate electrode length is increased to improve current flow, then the current carrying capacity is improved, but the parasitic capacitance increases worsening switching characteristics

Engineering Contradiction:
Improvecurrent carrying capacityVSAvoidparasitic capacitance
Core Design Contradiction:
PowerVSLoss of energy

Solution Approach 1:

The gate electrode is divided into multiple sections with different lengths along the channel direction. The first gate electrode has a first length, the second gate electrode has a second length shorter than the first, and the third gate electrode has a third length longer than the second. This segmentation allows different portions of the gate electrode to have optimized lengths for their specific functions, reducing overall parasitic capacitance while maintaining current carrying capacity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different sections of the gate electrode are given different local properties (different lengths) to optimize performance in specific regions. The varying gate lengths create localized electric field distributions that reduce parasitic capacitance in critical areas while maintaining adequate current flow in other regions.

Inventive Principle:
Principle #3Local quality

2Loss of energy

If the gate electrode length is decreased to reduce parasitic capacitance, then switching characteristics are improved, but the current flow capability deteriorates

Engineering Contradiction:
Improveparasitic capacitanceVSAvoidcurrent carrying capacity
Core Design Contradiction:
Loss of energyVSPower

Solution Approach 1:

Instead of uniformly shortening the gate electrode, it is segmented into sections with progressively varying lengths. This allows the gate electrode to have shorter effective length in regions where parasitic capacitance is critical, while maintaining longer effective length in regions needed for current carrying, thus resolving the contradiction between reducing capacitance and maintaining power capability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The gate electrode length parameter is changed progressively across different sections rather than being uniform. The first length, second length, and third length form a gradient that optimizes the balance between parasitic capacitance reduction and current carrying capacity maintenance.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively reduces parasitic capacitance, improving switching characteristics and preventing IGBT breakdown by limiting current flow and reducing switching losses.

Implementation Method 1

parasitic capacitance is generated between the emitter potential electrode, the collector potential electrode, and the gate potential electrode

Methodology Applied
Scientific EffectParasitic capacitance: Capacitance

Data Source

PatentUS11133393B2Semiconductor device and method of manufacturing the same
Publication Date: 2021.09.28 RENESAS ELECTRONICS CORP
  • US11133393B2 patent drawing
  • US11133393B2 patent drawing
  • US11133393B2 patent drawing

AI summary

The semiconductor device includes, in plan view, a gate electrode having a first portion located on a side surface portion where a plurality of emitter regions are formed, and a gate electrode having a second portion located between the plurality of emitter regions. The second portion of the gate electrode has a length shorter than first portion in the direction from the main surface to the back surface of the gate electrode of the semiconductor substrate.