Segmented Plasma Antenna Structure for Stable High-Density Discharge
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Solution Overview
Problem
Conventional inductively coupled plasma generating devices face instability in plasma control due to internal/external pressure, gas type, power applied, current, and voltage, leading to durability issues, especially as device size and area increase.
Innovation Solution
An antenna structure with multiple segments and capacitive elements, designed to induce plasma using AC power, where the segments have specific radii of curvature and lengths, and capacitive loads are connected in series to manage voltage and heat effectively, incorporating a coolant channel to absorb heat and prevent thermal damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a simple inductively coupled plasma generating device is used, then the structure is simple and utilization is high, but plasma control stability deteriorates due to pressure, gas type, power, current, and voltage factors
Solution Approach 1:
The antenna is divided into multiple segments (first antenna segment, second antenna segment, third antenna segment) with different radius of curvature values. This segmentation allows independent optimization of each segment's electrical characteristics to achieve stable plasma control across different operating conditions while maintaining an otherwise simple overall structure.
Solution Approach 2:
Different segments of the antenna are assigned different radius of curvature values to create local variations in electrical properties. The first antenna segment has a first radius of curvature, the second has a second radius of curvature, and the third has a third radius of curvature, allowing each local region to be optimized for specific plasma control requirements under varying pressure, gas type, and power conditions.
2Area of stationary object
If the device volume or area is increased to generate larger plasma, then plasma generation area is improved, but durability deteriorates due to increased heat and power requirements
Solution Approach 1:
The antenna structure is segmented into multiple sections that can be distributed over a larger area to generate extensive plasma. Each segment handles a portion of the power load, preventing any single point from overheating and thus maintaining durability while achieving large plasma generation area.
Solution Approach 2:
Different antenna segments with different radius of curvature values are positioned to create localized plasma generation zones. This allows the large area plasma generation to be distributed across multiple optimized local regions, each operating within safe thermal and power limits to preserve overall device durability.
3Power
If high voltage is applied to generate high-density plasma, then plasma density is improved, but safety deteriorates due to voltage distribution issues in the inductor
Solution Approach 1:
The antenna is divided into multiple segments that collectively handle the high voltage required for high-density plasma generation. By distributing the voltage across multiple segments with different radius of curvature values, the voltage stress on any single component is reduced, improving safety while maintaining the required overall power density for high-density plasma.
Solution Approach 2:
Different segments are designed with specific radius of curvature values optimized for their local voltage and power requirements. This local optimization allows the system to achieve high overall power density while each local segment operates within safe voltage limits, preventing breakdown and improving operational safety.
4Productivity
If plasma is induced at high power, then plasma generation efficiency is improved, but thermal damage risk increases due to heat generated during plasma induction
Solution Approach 1:
The antenna segments are distributed and configured to spread the power deposition across different spatial locations. This segmentation of the power delivery system allows high total power to be applied efficiently for plasma generation while preventing concentrated heat buildup that would cause thermal damage to any single component.
Solution Approach 2:
Each antenna segment with its specific radius of curvature is optimized to deliver power to specific regions, creating localized plasma zones. This distributes the heat generation across multiple locations rather than concentrating it, allowing high overall productivity while each local region operates within thermal safety limits.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces maximum voltage applied to the antenna, maintains plasma for longer periods, minimizes energy loss, and prevents thermal damage, enabling safer high-density plasma generation and reducing power consumption while preventing arc discharges.
Implementation Method 1
a device which induces plasma generation by generating an induced electric field and an induced magnetic field using an antenna structure including a plurality of antenna segments and a plurality of capacitive elements
Implementation Method 2
a plasma generating device which uses a coolant to effectively absorb heat generated when plasma is induced
Data Source
AI summary
This invention is an antenna structure inducing plasma in a chamber with applied alternative power, comprising: a first antenna segment and a second antenna segment arranged based on a virtual central axis to have a first curvature radius and a second curvature radius respectively, the central axis crossing a first plane, and a first capacitive load electrically connecting the first antenna segment and the second antenna segment, wherein the first antenna segment extends from one end of the first capacitive load with the first curvature radius having a first length and the second antenna segment extends from other end of the first capacitive load with the second curvature radius having a second length, and wherein a sum of the first length and the second length is shorter than a circumference of the first curvature radius or the second curvature radius.