Scanning Electron Microscope Focus Calibration Structure for 3D Semiconductor Analysis
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Solution Overview
Problem
Current scanning electron microscopes are limited in their ability to effectively analyze three-dimensional structures of semiconductor devices, as they primarily operate on two-dimensional measurements.
Innovation Solution
The scanning electron microscope apparatus includes an electron gun, focusing lens, electron detector, stage with a focus calibration structure, and a support layer, which allows for precise calibration and control of the electron beam's focus across multiple layers, enabling the determination of acceleration voltage values for accurate 3D imaging.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conventional scanning electron microscope is used for 2D structure measurement, then the measurement is simple and widely applicable, but the ability to analyze 3D structures is limited
Solution Approach 1:
The patent introduces a focus calibration structure with multiple layers at different heights to enable 3D structure analysis. By adding vertical dimension calibration targets, the system transitions from 2D to 3D measurement capability, allowing the electron beam to be focused and calibrated at different depth levels within the semiconductor device.
Solution Approach 2:
The focus calibration structure is pre-installed on the stage before sample measurement. This preliminary calibration structure allows the system to determine acceleration voltage values and establish focus parameters in advance, improving both 3D analysis capability and focus precision without adding complexity to the actual measurement process.
2Measurement precision
If the electron beam is focused on multiple layers, then 3D imaging accuracy is improved, but the device complexity increases
Solution Approach 1:
The focus calibration structure serves as an intermediary element between the electron beam and the actual sample. This calibration structure with multiple layers provides reference targets for determining acceleration voltage values at different depths, enabling precise 3D imaging without directly complicating the sample measurement process. The calibration structure acts as a mediator that establishes focus parameters before actual measurement.
3Measurement precision
If acceleration voltage values are determined for multiple layers, then the precision of electron beam focus is improved, but the operation time increases
Solution Approach 1:
The focus calibration structure is prepared and positioned in advance on the stage before sample measurement begins. By having the multi-layer calibration structure pre-established, the system can quickly determine acceleration voltage values for different depths during the measurement process without requiring time-consuming calibration procedures for each sample, thus improving focus accuracy while minimizing time loss.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the generation of accurate 3D images of semiconductor devices without disassembly, improving the precision and depth resolution of electron beam focus, allowing for detailed analysis of internal structures.
Implementation Method 1
an electron gun configured to generate an electron beam
Implementation Method 2
a focusing lens configured to concentrate the electron beam from the electron gun
Implementation Method 3
an electron detector configured to detect signals emitted from a sample in response to the electron beam incident on the sample
Data Source
AI summary
A scanning electron microscope apparatus including an electron gun configured to generate an electron beam, a focusing lens configured to concentrate the electron beam from the electron gun, an electron detector configured to detect signals emitted from a sample in response to the electron beam incident on the sample, a stage configured to receive the sample thereon, and a focus calibration structure on an upper part of the stage.