SEM Nanoprinter Module With In-Situ Spin Coating for 10 nm 3D Lithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current additive manufacturing technologies are limited to the macroscopic scale and struggle to achieve nanoscopic resolution with a variety of materials like conductors, semiconductors, and insulators, while traditional lithographic techniques are cumbersome and inefficient for 3D nanoscale manufacturing.
Innovation Solution
A 3D nanoprinter electron beam lithography module with an in-situ spin-coating stage integrated into a scanning electron microscope (SEM) system, utilizing liquid phase electron beam-induced deposition (LP-EBID) to achieve high-purity deposition and etching of materials at the nanoscale, enabling rapid prototyping and manufacturing of complex nanostructures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional lithographic techniques are used for 3D nanoscale manufacturing, then material deposition and removal can be achieved layer by layer, but the process becomes cumbersome and inefficient
Solution Approach 1:
The patent combines multiple functions (spin-coating, liquid dispensing, electron beam lithography, and material deposition) into a single integrated 3D nanoprinter system. This merging eliminates the need for separate lithographic steps and material deposition processes, thereby maintaining nanoscale precision while dramatically improving manufacturing efficiency through automated sequential operations within one chamber.
Solution Approach 2:
The system enables continuous manufacturing operations by maintaining vacuum conditions throughout the process and performing spin-coating, lithography, and deposition sequentially without breaking vacuum or removing the sample from the chamber. This continuity eliminates idle time between steps and sustains productive action throughout the entire manufacturing cycle.
2Manufacturing precision
If 2-photon polymerization is used to achieve nanometer resolution, then resolution in the hundreds of nanometers can be achieved, but the choice of available materials is limited to photopolymerizable resins
Solution Approach 1:
The electron beam lithography module serves multiple functions: it can write patterns in various resist materials, deposit different materials (metals, semiconductors, insulators) through liquid phase electron beam-induced deposition, and etch materials. This multi-functionality allows the system to maintain nanometer-scale resolution while being compatible with a wide range of materials beyond photopolymerizable resins, including conductors, semiconductors, and insulators.
3Adaptability or versatility
If gas phase electron or ion beam induced processing is used to add and subtract material, then arbitrary nanoscale patterns can be produced, but material purity is limited to 50 atomic % and processing times are large
Solution Approach 1:
The patent employs liquid phase electron beam-induced deposition instead of gas phase processing. Liquid precursors are delivered via capillary action or pressure-driven flow to the sample surface, where electron beam irradiation induces deposition of high-purity materials. This liquid-phase approach enables arbitrary nanoscale patterning while achieving material purity exceeding 90 atomic %, dramatically improving upon the 50 atomic % limitation of gas phase methods.
4Ease of manufacture
If ion beam processing is used for material deposition, then material can be added at the nanoscale, but damage is caused to the underlying layers and ion implantation and species intermixing occur
Solution Approach 1:
The patent replaces ion beam processing with electron beam-induced liquid phase deposition. Instead of using high-energy ions that physically damage underlying layers, the system uses low-energy electron beams to trigger chemical reactions in liquid precursor materials deposited on the sample surface. This substitution eliminates mechanical damage, ion implantation, and species intermixing while maintaining the capability for nanoscale material deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Facilitates the formation of thin layer-by-layer 3D nanostructures with resolutions down to 10 nm, allowing for rapid and precise deposition of conductors, insulators, and semiconductors, while maintaining high material purity and efficiency.
Implementation Method 1
the electron beam interacts with the liquid precursor, precipitating high purity (over 90%) metals and semiconductors through the electrochemical reduction of metallic cations by secondary or solvated electrons
Implementation Method 2
an electron or ion beam generator providing an electron and/or ion beam into the chamber and onto the workpiece
Implementation Method 3
The in-situ spin-coating stage can include a spin-coating motor, a spin-coating sample stub for holding a workpiece (or 'sample' or 'wafer' or 'substrate') and that is driven by the motor
Data Source
AI summary
A 3D nanoprinter electron beam lithography module for a lithography system, such as a scanning electron microscope (SEM) or an environmental SEM (ESEM) with a beam blanker and electron beam lithography attachment, but generally applicable to any electron beam lithography capable system. The module is comprised of an in-situ spin-coating stage that is compatible with a cooling-SEM stage, with a spin-coating motor, a spin-coating sample stub, a liquid waste collector cup, a liquid dispensing arm holding a tube bundle that is connected via tubing to micro-syringe pumps or a pressure driven flow controller or pumps connected to fluid reservoirs, an electron beam scan generator control box, electrical feedthroughs, control electronics, and a computing system responsible for controlling the entire module. The dispensing arm can be controlled by a servo motor.