Semiconductor Component Region Charging Risk Classification

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Solution Overview

Problem

Conventional design rule checks (DRCs) for semiconductor chips fail to adequately account for various circuit properties, leading to excessive use of protective diodes and inadequate identification of critical configurations, resulting in potential damage from electrostatic charging.

Innovation Solution

A method that classifies semiconductor component regions based on their properties to accurately assess the risk of electrostatic charging, allowing for more precise identification of critical areas and relaxation of design rules, using a weighted area ratio to determine the intensity of charging and requiring protective diodes only in severely jeopardized cases.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional design rule checks are used to identify critical configurations, then potential damage from electrostatic charging can be avoided, but too many protective diodes are required and circuit complexity increases

Engineering Contradiction:
Improveprotection against electrostatic chargingVSAvoidnumber of protective diodes
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies local quality by differentiating between various types of semiconductor component regions and applying different protection rules to each. Instead of uniformly protecting all regions, the method calculates a charging risk specifically for each region type (e.g., wells, isolated regions) and applies protective diodes only where necessary. This selective approach reduces the overall number of protective diodes while maintaining reliability where actually needed.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes parameters by introducing a charging risk calculation that considers multiple factors such as region area, connection topology, and process parameters. By evaluating these parameters and comparing them against thresholds, the system dynamically determines which regions require protection. This parameter-based approach replaces static, over-conservative design rules with adaptive, precision-based protection decisions.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If conventional design rule checks are used, then potential damage can be prevented, but the precision of identifying critical areas is insufficient

Engineering Contradiction:
Improveprotection against electrostatic chargingVSAvoididentification of critical configurations
Core Design Contradiction:
ReliabilityVSMeasurement precision

Solution Approach 1:

The patent segments the semiconductor circuit into distinct component regions (wells, isolated regions, connected regions) and evaluates each segment separately. This segmentation allows the charging risk calculation to focus on specific region characteristics rather than treating the entire circuit uniformly. The method calculates charging risk for each segment based on its specific properties, thereby precisely identifying which critical areas actually need protection.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent implements feedback by using the results of charging risk calculations to iteratively refine protection decisions. The system evaluates region properties, calculates charging risk, determines protection needs, and can adjust design rules accordingly. This feedback loop enables continuous improvement in identifying critical configurations, ensuring that protection is applied precisely where charging risk exceeds acceptable thresholds.

Inventive Principle:
Principle #23Feedback

3Reliability

If protective diodes are added to all identified regions, then damage risk is reduced, but manufacturing time and cost increase

Engineering Contradiction:
Improveprotection against electrostatic chargingVSAvoidmanufacturing efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent applies partial action by implementing protection only for regions that exceed specific charging risk thresholds, rather than protecting all regions uniformly. The method calculates charging risk for each region and applies protective diodes selectively to those regions where the risk justifies the additional manufacturing steps. This partial protection approach maintains reliability for critical regions while avoiding unnecessary manufacturing overhead for low-risk regions.

Inventive Principle:
Principle #16Partial or excessive action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces the risk of damage from electrostatic charging, minimizes the need for protective circuit structures, and enhances the precision of DRCs, thereby improving the reliability and efficiency of semiconductor chip production.

Implementation Method 1

Many production processes for semiconductor chips use plasma or other charge-based effects which bring about an electrical (e.g., electrostatic) charging of metal lines of the semiconductor chip

Methodology Applied
Scientific EffectElectrostatic charging: Electrostatics

Implementation Method 2

the charging can bring about a tunneling current through a dielectric layer, e.g., a gate dielectric, which results in the layer (e.g., the dielectric) being damaged or destroyed

Methodology Applied
Scientific EffectTunneling current:

Implementation Method 3

Such a protective diode provides for example a discharge path between the gate and the well of the transistor. On account of the leakage current, they limit the potential drop across the gate dielectric

Methodology Applied
Scientific EffectLeakage current: Conduction (electrical)

Data Source

PatentUS10896281B2Method, and storage medium and also device for carrying out same
Publication Date: 2021.01.19 INFINEON TECHNOLOGIES AG
  • US10896281B2 patent drawing
  • US10896281B2 patent drawing
  • US10896281B2 patent drawing

AI summary

A method for the computer-aided characterization of a circuit comprising a semiconductor layer and a semiconductor component region embedded in the semiconductor layer in an electrically insulated manner, wherein the semiconductor component region is optionally coupled to a dielectric layer structure to be protected, the method comprising determining an indication representing vis-à-vis the semiconductor layer an intensity of an electrical charging of the semiconductor component region by a production process used to produce the circuit, wherein a physical construction of the semiconductor component region is taken into account when determining the indication, and classifying the semiconductor component region taking account of the indication.