Multi-Region Semiconductor Exhaust Layout for Concurrent Processing
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Solution Overview
Problem
Semiconductor processing systems face challenges in efficiently flowing and exhausting materials within multiple processing regions, leading to potential deposition or damage within the system, and limiting the types of processes that can be performed concurrently.
Innovation Solution
The system includes a transfer region fluidly coupled with multiple processing regions, vertically translatable substrate supports, a transfer apparatus with a rotatable shaft and end effector, and a exhaust foreline with throttle valves, allowing for the delivery of purge gases through purge channels to prevent precursor intrusion and maintain pressure differentials between processing regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple processing regions are fluidly accessible for precursor delivery, then system versatility and concurrent processing capability are improved, but deposition or damage may occur within the system and material flow control becomes complex
Solution Approach 1:
The exhaust system is segmented into multiple separate foreline tails, each fluidly coupled with a separate processing region. This segmentation allows independent control of material flow and exhaust for each processing region, preventing precursor deposition in transfer regions while maintaining the ability to perform multiple processes concurrently.
Solution Approach 2:
Throttle valves are introduced as intermediary control elements in each foreline tail to regulate precursor flow and pressure differentials between processing regions. These valves act as mediators that prevent uncontrolled precursor migration between regions, thereby avoiding deposition or damage while preserving system versatility.
2Adaptability or versatility
If pressure differentials between processing regions are limited, then system simplicity is maintained, but the types of processes that can be performed concurrently are restricted
Solution Approach 1:
The system employs dynamically adjustable throttle valves in each foreline tail that can be independently controlled to create and maintain different pressure differentials between processing regions. This dynamic control capability enables a wide variety of concurrent processes while the modular valve configuration keeps the overall system complexity manageable.
Solution Approach 2:
The system utilizes parameter changes in pressure differentials between processing regions to enable different process types to be performed concurrently. By independently adjusting pressure parameters in each region through throttle valves, the system can accommodate diverse process requirements without requiring fundamental structural changes.
3Object-affected harmful factors
If purge gas is delivered through the transfer region, then precursor intrusion is prevented, but additional system components and complexity are introduced
Solution Approach 1:
The exhaust foreline system serves multiple functions: it provides primary vacuum exhaust from processing regions and simultaneously serves as a pathway for purge gas delivery to prevent precursor intrusion. This multi-functionality reduces the need for separate purge gas delivery components, thereby limiting the increase in system complexity while effectively preventing precursor contamination.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables efficient material flow and exhaust within the system, prevents precursor deposition or damage, and allows for concurrent performance of different processes in various processing regions, enhancing system functionality and throughput.
Implementation Method 1
delivering a purge gas into a transfer region... to maintain pressure differentials between processing regions
Implementation Method 2
exhausting the processing precursors and the purge gas through a pumping liner
Data Source
AI summary
Exemplary substrate processing systems may include a plurality of processing regions. The systems may include a transfer region housing defining a transfer region fluidly coupled with the plurality of processing regions. The systems may include a plurality of substrate supports. Each substrate support of the plurality of substrate supports may be vertically translatable between the transfer region and an associated processing region of the plurality of processing regions. The systems may include a transfer apparatus including a rotatable shaft extending through the transfer region housing. The transfer apparatus may also include an end effector coupled with the rotatable shaft. The systems may include an exhaust foreline including a plurality of foreline tails. Each foreline tail of the plurality of foreline tails may be fluidly coupled with a separate processing region of the plurality of processing regions. The systems may include a plurality of throttle valves.