Control Strategy Evaluation for Semiconductor Lithography Metrology
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Solution Overview
Problem
Current semiconductor manufacturing processes face challenges in efficiently evaluating and selecting optimal control strategies for lithographic processes, which balance quality metrics like yield and overlay with metrology effort and cost, leading to reduced productivity and throughput.
Innovation Solution
A method and computer program that determine a preferred control strategy by obtaining process data, candidate control strategies, and associated cost metrics, and selecting the best strategy based on quality and cost metrics, using a computer system to optimize metrology effort and improve process control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If metrology effort is increased to improve control strategy evaluation, then measurement precision and quality metrics are improved, but productivity and throughput are reduced
Solution Approach 1:
The patent applies partial action by performing metrology measurements on only a subset of targets rather than all targets. The system selectively measures certain metrology targets based on their importance to the control strategy, rather than measuring every target on the substrate. This reduces the overall metrology effort and time required while still obtaining sufficient data for effective process control and strategy evaluation.
2Manufacturing precision
If comprehensive process control is implemented to improve yield quality, then manufacturing precision is improved, but metrology cost and complexity increase
Solution Approach 1:
The patent segments the metrology measurement process into different categories based on target types and measurement purposes. It distinguishes between product targets and dedicated metrology targets, and further categorizes metrology targets by their relevance to different control strategies. This segmentation allows the system to apply appropriate measurement efforts to different target groups, reducing overall complexity while maintaining comprehensive process control for quality improvement.
3Measurement precision
If extensive metrology measurements are performed to evaluate control strategies, then quality metric data is improved, but loss of time and productivity are worsened
Solution Approach 1:
The patent implements preliminary action by pre-categorizing and prioritizing metrology targets before actual measurements are performed. The system identifies which metrology targets are most critical for evaluating specific control strategies in advance, and prepares measurement plans that focus on these high-priority targets first. This preliminary organization enables faster data collection and reduces the time required to obtain sufficient quality metric data for control strategy evaluation.
Data Source
AI summary
A method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method includes: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy including an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.