Semiconductor Surface Metal Analysis Using Hydrophobic Liquid Confinement
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Solution Overview
Problem
Existing metal analyzers face challenges in accurately analyzing metal contamination on semiconductor devices due to complications in liquid collection and scanning, which can introduce impurities and require extensive time, especially when dealing with small regions.
Innovation Solution
A system that uses a hydrophobic material to define inspection regions on semiconductor substrates, allowing for precise application and collection of inspection liquids, followed by mass spectrometry to analyze metal components, thereby minimizing impurity mixing and reducing collection time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a wiping material is immersed in liquid to collect metal contamination, then collection work becomes complicated and other impurities are easily mixed into the wiping material, but this method can collect metal contamination from the semiconductor device surface
Solution Approach 1:
The patent extracts the liquid collection process from the semiconductor device surface without using a wiping material. Instead, the liquid is applied to the surface and then suctioned away, separating the collection function from the wiping function and eliminating the complexity of immersing and handling wiping materials.
Solution Approach 2:
The patent introduces a liquid as an intermediary medium between the semiconductor device surface and the collection system. The liquid carries the metal contamination from the surface to be collected by suction, avoiding direct contact with wiping materials that could introduce impurities.
2Manufacturing precision
If the nozzle size is made significantly small to scan small regions, then scanning capability improves, but it takes a long time to scan a wide range
Solution Approach 1:
The patent makes the nozzle system dynamic by enabling it to move across the semiconductor device surface. The nozzle can be positioned at different locations and orientations, allowing it to inspect both small specific regions and large areas efficiently by combining precise positioning with motion capability.
3Measurement precision
If liquid is scanned over the semiconductor device surface to collect metal contamination, then metal analysis can be performed, but it is not possible to scan a region smaller than the nozzle size
Solution Approach 1:
The patent employs a dynamic nozzle system that can move and reposition itself to inspect regions of various sizes. The nozzle is not fixed in size or position but can be dynamically adjusted to match the inspection requirements, whether for small localized areas or larger regions.
4Manufacturing precision
If a hydrophobic material is supplied to surround an inspection region, then inspection liquid can be precisely contained and collected, but this adds a step to the analysis process
Solution Approach 1:
The patent replaces the mechanical approach of using a hydrophobic material barrier with a suction-based collection system. Instead of preventing liquid from leaving the inspection region through hydrophobic boundaries, the system actively draws the liquid back into the collection container, eliminating the need for hydrophobic materials and their associated application steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables efficient and accurate metal analysis by ensuring the inspection liquid stays within defined regions, reducing collection time by up to two-thirds and minimizing impurity mixing, thus enhancing the precision and speed of metal contamination detection.
Implementation Method 1
a first supplier configured to provide a hydrophobic material on the sample, and surround an inspection region on the sample with the hydrophobic material
Implementation Method 2
performs mass spectrometry on a metal component contained in the collected liquid
Data Source
AI summary
An analysis system includes a stage that supports a sample. The analysis system includes a first supplier configured to provide a hydrophobic material on the sample, and surround an inspection region on the sample with the hydrophobic material. The analysis system includes a second supplier configured to provide an inspection liquid over the inspection region. The analysis system includes a collector configured to collect the inspection liquid. The analysis system includes an analyzer configured to analyze a component contained in the collected inspection liquid.