Image Sensor Isolation Grid for Higher Quantum Efficiency

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Solution Overview

Problem

CMOS image sensors face challenges in enhancing quantum efficiency and suppressing cross-talk between pixels, which affects their performance in capturing images effectively.

Innovation Solution

Incorporating an isolation structure with a conductive grid overlying the semiconductor substrate, electrically connected to interconnects on both sides, and positioned around photodiodes, which reflects light to prevent cross-talk and enhance quantum efficiency by ensuring incident light is focused on individual pixels.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If an isolation structure with conductive grid is added to reflect light and prevent cross-talk, then quantum efficiency is improved, but device complexity increases

Engineering Contradiction:
Improvequantum efficiencyVSAvoiddevice complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The isolation structure is segmented into a grid pattern with conductive elements arranged in rows and columns, creating multiple isolated regions that reflect light locally rather than requiring a continuous complex structure throughout the entire sensor

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The conductive grid serves multiple functions simultaneously: it acts as an isolation structure between pixels, a light reflection surface to redirect photons to photodiodes, and an electrical connection path, thereby improving quantum efficiency without proportionally increasing complexity

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Measurement precision

If the conductive grid is positioned around photodiodes to reduce cross-talk, then image quality is improved, but manufacturing precision requirements increase

Engineering Contradiction:
Improveimage qualityVSAvoidmanufacturing precision
Core Design Contradiction:
Measurement precisionVSManufacturing precision

Solution Approach 1:

The conductive grid is merged with the interconnect structure, combining the isolation function with existing electrical connection pathways, thereby reducing the need for separate precision-aligned components and lowering manufacturing precision requirements

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The conductive grid acts as an intermediary element between the incident light and the photodiode, providing a standardized interface that simplifies alignment requirements by creating a predictable light reflection path without requiring direct precision positioning of multiple components

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The conductive grid improves image sensor performance by reducing cross-talk and increasing quantum efficiency, leading to better image acquisition and processing capabilities.

Implementation Method 1

the conductive grid and the interconnect are electrically connected to each other. The color filter and the microlens are disposed over the conductive grid and overlapped with the photodiodes

Methodology Applied
Scientific EffectLight reflection: Reflection

Data Source

PatentUS20230395631A1Image sensor and manufacturing method thereof
Publication Date: 2023.12.07 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20230395631A1 patent drawing
  • US20230395631A1 patent drawing
  • US20230395631A1 patent drawing

AI summary

An image sensor includes a pixel and an isolation structure. The pixel includes a photosensitive region and a circuitry region next to the photosensitive region. The isolation structure is located over the pixel, where the isolation structure includes a conductive grid and a dielectric structure covering a sidewall of the conductive grid, and the isolation structure includes an opening or recess overlapping the photosensitive region. The isolation structure surrounds a peripheral region of the photosensitive region.